专利摘要:
Apparatus for photocuring a coating on a moving substrate in a system including a first and second tunnel with a treating chamber located therebetween and housing at least 1 mercury vapor lamp. The mercury vapor lamp has associated therewith a reflector module for directing UV light to the substrate. The reflector module temperature is controlled by physically spacing a liquid cooled heat sink from the reflector module so that only radiation heat transfer occurs therebetween.
公开号:SU803851A3
申请号:SU772542048
申请日:1977-11-04
公开日:1981-02-07
发明作者:Генри Троу Гарден
申请人:Юнион Карбид Корпорейшн (Фирма);
IPC主号:
专利说明:

The invention relates to the field of coating, in particular to devices for curing coatings, curing dichs under the action of light, using mercury lamps. A device for photo-hardening a coating on a moving substrate is known, which contains inlet and outlet tunnels between which an injector is installed to deliver inert gas to the substrate and a working chamber with a mercury lamp mounted in it with a reflex fixture 1. However, in this device, mercury lamps are used together with reflectors, whose surface is cooled by heat removal. In many cases, the excess coating evaporates from the surface and is deposited on the surfaces of the reflectors and lamps, causing a decrease in UV radiation power and resulting in uneven curing. The aim of the invention is to prevent vapor deposition on the surface of the reflector device. The delivered pellet is achieved by the fact that, in a device for photo-curing the coating on a moving substrate containing the inlet and outlet tunnels, an injector is installed between KOTOptJMH for supplying inert gas to the substrate and a working chamber with a mercury lamp mounted in it with a reflector device, the latter is equipped with a cooled liquid heat sink device, installed with a zoogram relative to a reflex device. In addition, the device is equipped with a device installed between the inert gas supply injector and the working chamber to supply an additional inert gas flow in the direction of the two, and the height of the substrate output tunnel exceeds the height of the input tunnel, the opposite surfaces of the reflector and heat sink devices being black. FIG. 1 shows schematically the device / in FIG. 2 shows section A-A in FIG. 1. The device contains a working chamber 1 in which an ultraviolet radiation source 2 is mounted, which is a series of medium-pressure mercury lamps, a reflex / reflective device 3, partially surrounding this source and serving
The direction of the ultraviolet radiation on the surface of the substrate, the impurity passes through the entrance tunnel 4 of the working cylinder, where the coating on the substrate is cured under the action of ultraviolet radiation, and then exits through the exit tunnel 5.
The inert gas is supplied from the injection chamber b through the injector 7. The purpose of this gas is to isolate the surface of the moving substrate and remove oxygen that inhibits hardening. The device also provides a second source of inert gas, which is fed through the shielding gas chamber 8, having an exit slit 9. A cooled heat sink 10 is mounted over the reflector device 3 with a gap relative to it. The heat sink is carried out only by radiation.
The opposite surfaces of the reflector 3 and the heat-removing 10 fixtures are black. The device works as follows.
The coated substrate enters the tunnel 4 of the working chamber. The inert gas is supplied from chambers 6 and 8. Although the direction of gas flow in Fig. 1 is shown as parallel to the movement of the substrate, the flow angle may be from 3 to IS with respect to it. The flow of shielding gas entrains and captures almost all the vapors emitted from the surface of the coating, as it cures, and carries them through the tunnel 5. The height (h) of the tunnel 5 is greater than the height (E) of the input tunnel 4. This allows couples it is more easy to leave the working chamber together with the shielding gas flow. The emitted vapors coviate under a laminar flow of screened inert gas and raise it above the surface of the coating, thereby increasing the thickness of the laminar flow layer. Therefore, the high height of the output tunnel .5 compared to the height of the input gun 4 facilitates the removal of vapors from the device. The use of a shielding gas flow is advisable, however, the device functions normally without such a shielding gas flow.
The water-cooled heat removal device 10 is located relative to the surface of the reflector device 3 in such a way that heat transfer between the surface of the reflector 3 and the TV lead device 10 is carried out only by radiation. By adjusting the surface temperature of the reflector device (in order to reduce conventional flows), vapor deposition on its surface is greatly reduced.
The device can be made in various ways.
For example, to reduce the amount of inert gas used in the system, you can create a pair of shielding air flow below the first chamber 6 and in front of the second chamber 8. Exhaust tunnels can be made in front of the inlet tunnel and after the exit tunnel, and the ratio of gas pressure in the tunnel can be adjusted. x to distribute the flow 5 between each of the exhaust tunnels in such a way as to maintain the flow of inert gas which removes the maximum possible amount of vapors.
It will prevent the ingress of / vapors to the surface of the reflector device by using a screen pair of gas flow.
权利要求:
Claims (4)
[1]
1. A device for photo-curing the coating on a moving substrate, containing an inlet and an output tunnel, between which an injector is installed to supply inert gas to the substrate and a working chamber with a mercury lamp mounted in it with a reflex fixture, characterized in that in order to prevent vapor deposition on the surface reflector device, the latter is equipped with a cooled liquid heat removal device, installed with a gap relative to the reflector device.
[2]
2. The device according to claim 1, which is equipped with a device installed between the injector for supplying inert gas and the working kainer to supply an additional stream of inert gas in the direction of movement of the substrate,
[3]
3. The device according to Clause 1, concerning the use of tl ichayuyets that the height of the exit tunnel exceeds the height of the entrance tunnel.
[4]
4. The device according to Claim 1, which means that the opposite surfaces of the reflector and heat-removing devices are black.
Sources of information taken into account in the examination
1. The patent ouA i 3936950, cl. 34-4, published. 10,02,76 (prototype), / f /
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同族专利:
公开号 | 公开日
FR2370071A1|1978-06-02|
FR2370071B1|1983-02-25|
JPS5537949B2|1980-10-01|
DK492377A|1978-05-06|
JPS5363786A|1978-06-07|
NO773792L|1978-05-08|
AU3033177A|1979-05-10|
US4135098A|1979-01-16|
NO154684C|1986-12-03|
NO154684B|1986-08-25|
DE2749439A1|1978-05-11|
SE7712490L|1978-05-06|
ES463846A1|1978-06-16|
DE2749439B2|1980-02-28|
NL7712191A|1978-05-09|
SE438107B|1985-04-01|
BE860509A|1978-05-05|
ES465054A1|1978-09-01|
ZA776207B|1978-06-28|
AU511287B2|1980-08-07|
IT1090430B|1985-06-26|
DE2749439C3|1980-10-16|
GB1591442A|1981-06-24|
CA1100904A|1981-05-12|
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法律状态:
优先权:
申请号 | 申请日 | 专利标题
US05/739,120|US4135098A|1976-11-05|1976-11-05|Method and apparatus for curing coating materials|
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