• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    The present invention relates to a device for hydrochemical treatment of substrates, in particular of solar cells, comprising at least one pick-up device, wherein in the at least one pick-up device Jr at least one substrate and at least one process medium can be introduced or introduced, the at least one substrate having at least one treatment side, which Jr is operable or operatively connected to the process medium, the at least one fluid guide member having a defined surface structure Jr comprising the at least one receiving device, the at least one defined surface structure of the at least one fluid guide member Jr being configured and arranged to provide control of the process medium Wigs with the defined surface structure, and the at least one defined surface structure is arranged or arranged lying opposite and in a predetermined solid ledge spaced from the at least one treatment side of the at least one substrate, and wherein the process medium in the space between the defined surface structure of the at least one fluid guide element and the at least one treatment side of the at least one substrate Jr movable or moved by means of a flow generating device and / or the at least one treatment side of the at least one substrate is movable or moved along the defined surface structure of the at least one the fluid guide element and / or the defined surface structure of the at least one fluid guide element Jr movable or moved Wigs with the at least one treatment surface of the at least one substrate, a method and a use of a device according to the invention.
    公开号:SE1451195A1
    申请号:SE1451195
    申请日:2014-10-08
    公开日:2015-04-16
    发明作者:Juergen Hackenberg；Michael Lingner；Harald Bauer
    申请人:Bosch Gmbh Robert；
    IPC主号:
    专利说明:

    The present invention relates to a device for hydrochemical treatment of substrates, in particular of solar cells, comprising at least one recording device, wherein in the at least one recording device Jr at least one substrate and at least one process medium can be introduced or introduced, wherein the at least one substrate has at least one treatment side, which is or can be brought into operative connection with the process medium.
    Background Art For the production of solar cells, substrates are coated with various metal and semiconductor layers as well as buffer layers by steam treatment, sputtering, by galvanic separation, or by chemical bath separations.
    In particular in the case of Cu (ln, Ga) (S, Se) 2 solar cells (CIGS solar cells) a semiconductor, so-called buffer layer, is used for the separation of semiconductors, also known in English as Chemical Bath Deposition (CBD). The buffer layer then comprises, for example, cadmium sulphide (CdS), undoped zinc oxide (ZnO), Indium (III) sulphide (In2S3), and / or (Zn, Mg) 0.
    The coating with a buffer layer takes place according to the state of the art in a precipitation reaction, in which different reaction mechanisms, which are partially embedded, hinder each other, take place simultaneously. In order to achieve the desired reaction, concentration, temperature and flow rate must be kept within narrow limits.
    A challenge in the production of buffer layers is that undesired colloids formed in a side reaction, especially during the CdS precipitation, do not end up on the surface of the substrates intended for coating. 2 According to the state of the art, it is a clear edge to keep the used process medium in motion. For example, DE 10 2005 025 123 A1 discloses that thin-layer chalcopyrite (CIS) solar cells lying or hanging in a sample holder are introduced into an etching solution and subjected to a certain time by the etching solution. In this case, the solution must be able to be framed manually by magnetic stirrers or by ultrasound.
    Alternatively, it is within the state of the art that the substrates be stirred over the process medium so that formed colloids and other undesired particles settle down. However, it must be taken into account that when applying buffer layers, the flow rate of the process media must be kept within narrow limits. Therefore, in order to produce a fluid movement in relation to the substrate, according to the prior art the substrate is guided with a predetermined inclination through the process medium and a system is arranged consisting of rollers arranged perpendicular to the substrate just above the substrate intended for coating. The process medium is distributed by means of the rollers across the substrate and is continued in motion and runs superficially over the substrate until the next roller. There 5nyo p5 tvaren is distributed and mixed thoroughly. However, this has the disadvantage that, although only a slightly changed flow rate between the rollers can be provided, a change in the flow rate occurs in the area of the rollers. In addition, the rollers must be very loosely arranged over the substrate, so that in the case of thin substrates the flow ratio of others is changed by a deflection thereof.
    It would therefore be unreasonable to be able to return to devices which do not suffer from the disadvantages of the state of the art, and to enable a particularly reliable coating of substrates, in particular with buffer layers.
    Description of the invention This object is solved in that the device is comprised of at least one fluid control element with a defined surface structure of the at least one receiving device, the at least one defined surface structure of the at least one fluid control element being configured and arranged to provide a control of the process medium Wigs with the defined surface structure, and the at least one defined surface structure Jr arranged or arranged 3 lying opposite and in a predetermined fixed ledge spaced from the at least one treatment side of the at least one substrate, and wherein the process medium in the space between the defined surface structure of the at least one fluid guide element and the at least one treatment side of the at least one substrate by means of a flow generating device Jr is movable or displaceable and / or the at least one treatment side of the at least one substrate Jr is movable and is moved along the defined surface structure of at least one fluid guide element and / or the defined surface structure of the at least one fluid control element Jr is movable or Wigs is moved with the at least one treatment side of the at least one substrate.
    By means of the defined surface structure according to the invention having the at least one fluid control element, the flow of a process medium Wigs with a treatment side of a substrate can be influenced. By a suitable choice of the defined surface structure, in particular, a homogeneous flow of the process medium can be achieved.
    The term process medium is to be understood by all those skilled in the art to mean separation solutions, for example an aqueous, alkaline adsorption solution, which contains at least one salt of a metal and in the group Cd, In, Mg, Sn and Zn with a concentration in the range of 1 to 500 mmol / 1, or an aqueous solution of a sulfur-giving substance with a concentration in the range of 30 to 2500 mmo1 / 1, in particular 200 to 1500 mmo1 / 1. The solutions suggested by way of example are obviously to be understood exclusively as examples. It is clear to the person skilled in the art that the device according to the invention is not limited to the mentioned process media.
    In this case, in accordance with the invention, the defined surface structure of the at least one fluid guide element is arranged opposite and spaced from the treatment side of the substrate, in order to provide a defined flow channel to the process medium between the treatment side and the defined surface structure.
    To generate the flow desired, the process medium itself can be agitated by means of a flow generating device, for example a nozzle. Alternatively or additionally, the treatment side of the substrate in the process medium can be led past Wigs with the defined surface structure, and thus provide a, possibly extra, flow. Of course, it can also alternatively or additionally be provided that the defined surface structure is moved in the process medium, and thereby a defined, possibly in turn extra, flow is generated along the treatment side of the substrate.
    It is thereby obvious to the person skilled in the art that the defined distance between the defined surface structure and the treatment side can be virtually optional, for example depending on the dimensions of the substrate, the desired flow rate of the process medium, the selected process medium and / or the selected defined surface structure. SarskiIt lamped is then a distance between loch 50 mm, in particular between loch 10 mm.
    With the device according to the invention it thus becomes possible that the minimum inflow required in currentless coating processes on the treatment side of a substrate can be provided homogeneously. In particular, the homogeneous flow of the process medium can prevent colloids or other undesirable particles from being deposited in local dead zones of the flow. Colloids and other undesired particles experience in the device according to the invention comparable to the working principle of a cross-flow filter Wain a lifting force away from the treatment side. Thus, the device according to the invention ensures that the service life of the process medium until the next cleaning of the device or of the process medium and / or a necessary replacement of the process medium is significantly required.
    The device according to the invention also makes it possible that the receiving area can be selected with a small volume and / or that only a small amount of process solution is required compared with devices known from the prior art. Due to the missing dead zones of the flow and the provided lifting force, a relatively large proportion of colloids and other undesired particles can be present in the process medium, without the quality of the separation being adversely affected and these depositing on the treatment side of the substrate.
    The substrate itself is alit according to the desired area of application almost optionally, in addition to rigid substrates such as glass or aluminum, for example a polymide substrate is conceivable. It is obvious in this context to the person skilled in the art that the device according to the invention is not limited to a certain substrate. It is thereby obvious to a person skilled in the art that materials of the type such as metal, glass and / or plastic can be coated. In particular, however, substrates may be included or provided by the invention which are used in solar cells.
    According to an embodiment of the invention, it may be advantageous for the at least one receiving device to have at least one bottom element, at least two opposite side elements and an opening side opposite the bottom element, in particular the at least one fluid guide element Jr being arranged on the bottom element and the defined surface structure. the fluid control element Jr arranged on the side opposite the bottom element.
    It may prove advantageous if the flow of the process medium is directed through a provided flow channel, comprising the treatment side of the substrate and the side elements as well as the bottom element of the receiving device. With the designation side elements and bottom elements, the present invention is to be understood exclusively by way of example and serves to make the device according to the invention lighter. The bottom element can of course also form a side element, it is also conceivable that the treatment side of the substrate forms a side element, whereby for instance the substrate begins vertically, in particular hanging, into the receiving area.
    According to an embodiment of the present invention, it may be preferred that it comprises at least one transfer device, which is configured and arranged to move the at least one treatment side of the at least one substrate along the defined surface structure of the at least one fluid guide element, the at least one transfer device Jr designed in particular in the form of at least one vacuum cleaner and / or the at least one flow generating device is designed in the form of a magnetic stirrer, an ultrasonic sensor, a vibration or vibration element, a propeller, a nozzle and / or a pump. In particular, the use of a vacuum cleaner has proved advantageous for tilting and moving the substrate. Likewise, a flow generating device in the form of a magnetic stirrer, an ultrasonic sensor, a swing or vibration element, a propeller, a nozzle and / or a pump depending on the selected substrate and the selected process solution can be advantageous.
    It may also be advantageous according to an embodiment of the invention that the defined surface structure of the at least one fluid guide element is formed in the form of a, in particular regular, corrugated, knurled, punched and / or stiffened surface structure, of a spherical distribution and / or of a elongated metal plate.
    These surface structures have all been found to be advantageous in providing a desired flow of the process medium.
    In particular, it may be advantageous for the at least one treatment side of the at least one substrate to be insertable or inserted into the at least one process medium or, the opposite side of the at least one substrate, and in particular the side edges of the at least one substrate, not is insertable or inserted into the at least one process medium.
    In this case, it may be preferred that by means of a sealing device which can be sealed, respectively, the side opposite the treatment side of the at least one substrate, and in particular the side edges of the at least one substrate, faces the at least one process medium, in particular the sealing device being provided in the form of a flow machine, in particular a flow machine in the form of a propeller or fan, the pressure side of which is at least circumferentially, in particular vertically, can be arranged or arranged above the opening side of the at least one receiving area.
    The device according to the invention thus enables that only one side of the substrate is bringable or is in operative connection with the process medium. In this case, the upper side of the acquisition area can be taken through the substrate itself. In this way, a target-oriented coating of only one side of a substrate while simultaneously sealing the acquisition area can be provided.
    With sealing, a complete as well as a partial sealing of the recording area can be understood.
    When coating substrates with CdS as a buffer layer, for example, it is problematic that the coating is toxic. The provided seal is therefore advantageous. In addition, a flow machine according to the invention in particular can by simple means lead to an avoidance of an exit of toxic fumes while at the same time protecting the side edges and the side of the substrate opposite the treatment side against a contact with the process medium.
    According to the invention it can also be provided that at least one of the side elements of the at least one receiving area is U-shaped, the U-shaped side element being arranged circumferentially over the at least one substrate, and inside the U-shaped side element a suction device can be arranged or arranged .
    This has the advantage, especially in toxic process media, that an exit of toxic Angor can be prevented.
    In particular, according to an embodiment of the invention, it may be envisaged that at least two acquisition areas are included, the at least one substrate being movable from one acquisition area into another acquisition area, in particular by means of the at least one transfer device.
    By means of a cascade-like arrangement of at least two acquisition areas, small treatment zones of the substrate can be provided with one or more process media, the acquisition areas in all cases having only a small volume. Therefore, when moving a substrate from one acquisition area to another acquisition area, only a small amount of process medium may need to be discarded. By a suitable arrangement of the uptake, a wide variability of different treatment zones can be made possible. The invention also provides a process for the chemical treatment of substances in a device according to the invention, comprising the following steps, in particular in this order; introducing a process medium into the at least one receiving area introducing the treatment side of the at least one substrate into the process medium moving the process medium in the space between the defined surface structure of the at least one fluid control element and the treatment side of the substrate by means of the flow generating device and / or with the defined surface structure of the at least one fluid guide element and / or movement of the defined surface structure, the at least one fluid guide element has along the treatment side of the substrate.
    Finally, the invention also provides a use of a device according to the invention for hydrochemical separation of a buffer layer of a solar cell, in particular of a Cu (ln, Ga) (S, Se) 2 solar cell, in particular of cadmium sulphide (CdS), not doped zinc oxide (ZnO), (In2S3), and / or (Zn, Mg) 0.
    Drawing Further criteria and advantages of the invention form part of the following description, in which a preferred embodiment of the invention is exemplified by means of schematic drawings. In this case: Figure 1 shows a perspective representation of an embodiment of a device according to the invention; Figure 2 is a side view of the embodiment according to Figure 1 in section; and Figure 3 is another side view of the embodiment according to Figure 1 in section. 9 Embodiment Figure 1 shows an embodiment of a device 1 according to the invention for hydrochemical treatment of substrates, in particular of solar cells, shown. The device 1 comprises a pick-up device 3, in which a substrate 5 and a process medium 7 Jr are inserted. The substrate 5 has a treatment side (not shown), which is in operative connection with the process medium 7, and a side 9 lying opposite the treatment side.
    A fluid control element 11 having a defined surface structure 13 is shown on a bottom element 16 in Figures 2 and 3. The fluid control element 11 is configured and arranged to provide a control of the process medium 7 Wigs with the defined surface structure 13. Thereby the defined surface structure 13 is arranged opposite and in a predetermined solid ledge spaced from the at least one treatment side 15 of the at least one substrate 5.
    The process medium 7 can be moved in the space between the defined surface structure 13 of the fluid control element 11 and the treatment side 15 of the substrate 5 by means of a flow generating device (not shown). Alternatively or additionally, the substrate 1 may be moved by means of a displacement device (not shown) in relation to the defined surface structure 11, or the defined surface structure 11 may be moved in relation to the substrate 1, to generate a flow of the process medium Wigs with the defined surface structure 11 and the treatment side of the substrate 5. 15.
    In Figures 2 and 3 Jr further shown that the treatment side 15 Jr of the substrate 5 is inserted into the process medium 7, the side 9 of the at least one substrate 5, and in particular the side edges 17 of the substrate 5 opposite the treatment side 15, not being Jr inserted into the process medium 7.
    By means of a sealing device (not shown), the side 7 lying opposite the treatment side 15 of the substrate 5, and in particular the side edges 17 of the substrate 5, is applied to the process medium 7. The sealing device (not shown) can then be provided in the form of a flow machine, in particular a flow machine. of a propeller or fan, the pressure side of which is arranged at least circumferentially, in particular vertically, over the opening side 3 of the at least one receiving area.
    A side element 19 is U-shaped, the U-shaped side element 19 being arranged circumferentially over the substrate 7, and inside the U-shaped side element 19 a suction device (not shown) is arranged.
    By means of the flow machine not shown, an overpressure can thus be generated in the area of the side 9 of the substrate 5 not intended for treatment, so that it does not come into contact with the process medium 7. For this purpose it can generate the overpressure am / arid fluid, e.g. air, is extracted by means of the extraction device (not shown) in the area of the U-shaped side element 19.
    The criteria according to the invention disclosed in the above description, in the claims and in the drawings may be essential as well as in any arbitrary combination for the realization of the invention in its various embodiments. 11
    权利要求:
    Claims (10)
    [1]
    A device for hydrochemical treatment of substrates, in particular of solar cells, comprising at least one acquisition device (3), wherein at least one substrate (5) and at least one process medium (7) are insertable or are introduced into the at least one acquisition device (3), wherein the at least one substrate (5) has at least one treatment side (15), which is bringable or is in operative connection with the process medium (7), characterized in that at least one fluid control element (11) with a defined surface structure (13) is comprised of the at least one receiving device (3), the at least one defined surface structure (13) having the at least one fluid control element (11) configured and arranged to provide a control of the process medium (7) Wigs with the defined surface structure (13), and the at least one defined surface structure (13) is arranged or arranged opposite lying and in a predetermined fixed ledge spaced from the at least one treatment side (15) of the at least one substrate (5), and wherein the process medium (7) in the space between the defined surface structure (13) has the at least one fluid control element (11) and the at least one treatment side (15) of the at least one substrate (5) is movable or moved by means of a flow generating device and / or the at least one treatment side (15) of the at least one substrate (5) is movable or is moved along the defined surface structure (13) has the at least one fluid guide element (11) and / or the defined surface structure (13) has the at least one fluid guide element (11 ) is movable or is moved along the at least one treatment side (15) of the at least one substrate (5).
    [2]
    Device according to claim 1, characterized in that the at least one receiving device (3) has at least one bottom element (16), at least tv5 opposite side elements (19, 19 ') and an opening side opposite the bottom element (16), wherein in particular the at least one fluid control element (11) is arranged on the bottom element (16) and the defined surface structure (13) has the at least one fluid control element (11) arranged on the side opposite the bottom element (16). 12
    [3]
    Device according to claim 1 or 2, characterized in that at least one displacement device is included, which Jr is configured and arranged to move the at least one treatment side (15) of the at least one substrate (5) Wigs with the defined surface structure (13) of the at least one fluid control element (11), wherein the at least one transfer device in particular Jr is formed in the form of at least one vacuum cleaner and / or the at least one flow generating device Jr formed in the form of a magnetic stirrer, an ultrasonic sensor, a swing or vibration element, a propeller, a nozzle and / or a pump.
    [4]
    Device according to any one of the preceding claims, characterized in that the defined surface structure (13) of the at least one fluid guide element (11) is formed in the form of a, in particular regular, corrugated, knurled, punched and / or stiffened surface structure, of a spherical distribution and / or of an elongated metal plate.
    [5]
    Device according to any one of the preceding claims, characterized in that the at least one treatment side (15) of the at least one substrate (5) is insertable or inserted into the at least one process medium (7), the side (15) opposite the treatment side (15) 9) of the at least one substrate (5), and in particular the side edges of the at least one substrate, are not insertable or inserted into the at least one process medium (7).
    [6]
    Device according to claim 5, characterized in that by means of a tapping device which is tautable or touches the side (9) lying opposite the treatment side (15) of the at least one substrate (5) and in particular the side edges of the at least one substrate (5), in relation to the at least one process medium (7), in particular the sealing device being provided in the form of a flow machine, in particular a flow machine in the form of a propeller or fan, the pressure side of which is at least circumferentially, in particular vertically, arranged or arranged over the opening side of the least one recording area (3).
    [7]
    Device according to any one of the preceding claims, characterized in that at least one of the side elements (19) of the at least one receiving area Jr is U-shaped, the U-shaped side element (19) being arranged circumferentially over the at least 13 one substrate ( 5), and inside the U-shaped side element a suction device can be arranged or arranged.
    [8]
    Device according to any one of the preceding claims, characterized in that at least two receiving areas (3) are included, wherein the at least one substrate (5) is movable from one receiving area (3) into another receiving area, in particular by means of the at least one transfer device. .
    [9]
    A method of hydrochemical treatment of substances in a device according to any one of the preceding claims, comprising the filling steps, in particular in this order: 1. introduction of a process medium into the at least one acquisition area 2. introduction of the treatment side of the at least one substrate into the process medium 3. moving the process medium in the space between the defined surface structure of the at least one fluid control element and the treatment side of the substrate by means of the flow generating device and / or moving the treatment side of the substrate along the defined surface structure of the at least one fluid control element and / or moving the defined the surface structure has the at least one fluid guide element along the treatment side of the substrate.
    [10]
    Use of a device according to any one of claims 1 to 8 for chemically separating a buffer layer of a solar cell, in particular of a Cu (ln, Ga) (S, Se) 2 solar cell, in particular of cadmium sulphide (CdS) , undoped zinc oxide (ZnO), indium (III) sulfide (In2S3), and / or (Zn, Mg) 0. R. 345436 112
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    法律状态:
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    DE201310220810|DE102013220810A1|2013-10-15|2013-10-15|Device for the homogeneous wet-chemical treatment of substrates|
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