• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
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    • 专利摘要:
    The invention relates to a method for producing an electrochromic glazing comprising: (a) forming, on one side of a glass sheet, a complete solid electrochromic stack comprising successively - a first layer of a conductive oxide transparent (TCO1), - a layer of a cathodic-colored inorganic electrochromic material, called an electrochromic electrode (EC), - a layer of an ionic conductive inorganic solid electrolyte (IC), - a layer of intercalation material cation, called counter-electrode (CE), and - a second layer of a transparent conductive oxide (TCO2), then (b) the heat treatment of the complete electrochromic stack by irradiation with radiation having a wavelength between 500 and 2000 nm, said radiation being derived from a radiation device placed opposite the electrochromic stack, a relative displacement being created between said radiation device and said substrate so as to bring the electrochromic stack to a temperature at least equal to 300 ° C for a short time, preferably less than 100 milliseconds.
    公开号:FR3031197A1
    申请号:FR1463473
    申请日:2014-12-31
    公开日:2016-07-01
    发明作者:
    申请人:Saint Gobain Glass France SAS；
    IPC主号:
    专利说明:

    [0001] FIELD OF THE INVENTION The invention relates to the field of electrochromic glazings. More particularly, it relates to a process for heat treatment by irradiation of a complete mineral electrochromic stack on a transparent substrate. The electrochromic devices and in particular the electrochromic glazings comprise, in known manner, an electrochromic stack comprising a succession of five thin layers that are indispensable for the operation of the device, that is to say with the reversible color change following the application of a potential. electric. These five functional layers are the following: a transparent electroconductive first layer, an electrochromic layer formed of a material whose optical properties (absorption / reflection) vary according to its oxidation state, a layer of an electrolyte, solid, electronic insulator and ionic conductor, - a counter electrode and - a second transparent electroconductive layer. one or the other of the transparent electroconductive layers that can be in contact with the transparent substrate.
    [0002] In the most widespread electrochromic systems, these five layers all consist of inorganic solid materials, most often metal oxides, and are deposited by magnetron sputtering onto a glass substrate, generally in the same deposition installation. They are commonly called "all solid" electrochromic systems. The most widely used electrochromic mineral material is tungsten oxide. This oxide is a so-called intercalation material which, when it is reduced by the addition of electrons from the first transparent electroconductive layer, is capable of reversibly inserting protons or metal cations, in particular lithium ions. . Tungsten oxide is a cathodic-stained electrochromic material, i.e. a material which is colored in the reduced state and substantially colorless in the oxidized state. This cathodic coloring material is associated with a second cation intercalation material (counter-electrode) which is either an anodic color material (colored in the oxidized / colorless state in the reduced state) or a colorless or slightly colorless material. colored whose optical properties do not change significantly depending on its oxidation state. The magnetron sputtering manufacturing method of such a mineral electrochromic system with at least five solid layers comprises one or more heat treatment steps (annealing). Certain materials, in particular the metal oxides forming the two outermost transparent conductive layers, are deposited by magnetron cathode sputtering in a more or less amorphous form and must be hot crystallized, after deposition, to exhibit crystallinity and stability. conductivity sufficient. The performance and optical properties of the final product strongly depend on these annealing steps.
    [0003] The good conductivity of the transparent electroconductive layers determines the homogeneity of the coloring beyond a certain size of the glazing as well as the coloring / fading rate of the system. It is therefore generally sought to increase as much as possible the conductivity of the two transparent electroconductive layers. Annealing in an annealing furnace at too high a temperature or for a too long duration may however lead to an alteration of the electrochromic performance of the final product obtained, such as an increase in the resistance (R''e) of the TCOs or a lowering of the contrast between the colored state and the colorless state. In the context of its research aimed at optimizing the performance of glazings comprising electrochromic stacks of at least five layers as described above, the Applicant has carried out rapid thermal treatment tests by surface irradiation of substrates coated with stacks. complete electrochromic. Such fast flash or laser treatment could in fact advantageously replace the final annealing in an oven, at about 400 ° C., conventionally performed on the electrochromic glass sheet prior to its integration into a multiple glazing unit. On the occasion of such tests, the Applicant has surprisingly found that a rapid superficial annealing by irradiation of the complete electrochromic stack with at least five layers, made it possible not only to obtain an equivalent electrochromic system in terms of contrast between the colorless and colored state, but the coloring / decolouring reactivity of the system was significantly improved, even when the rapid irradiation annealing was performed on a substrate previously subjected to a usual annealing of about one hour in a furnace. 400 ° C. Rapid annealing by irradiation, for example by laser, of a complete electrochromic system can thus advantageously replace a conventional annealing in an oven, or it can be carried out in addition to such annealing; in both cases it will lead to a product which fades and recolors more rapidly than an identical product not subject to irradiation annealing. The rapid thermal irradiation treatment of the present invention, even after prior final annealing in an oven, does not alter or improve the overall contrast between the colored and bleached state. It makes it possible to obtain uniformly colored glazing units of larger size than the known method providing only a final annealing step in an oven at 400 ° C. It is known that rapid thermal treatments by irradiation of thin mineral coatings enable annealing at high temperature, i.e. at several hundred degrees, of coatings while maintaining the underlying substrate at the same time. relatively moderate temperatures. The particularly surprising aspect in the present invention is the observation that the irradiation thermal treatment method preserves certain layers within the annealed stack, while increasing the conductivity of the transparent electroconductive layers, even after a final annealing has been performed. in an annealing furnace. The subject of the present invention is therefore a method for manufacturing an electrochromic glazing comprising the following steps: (a) the formation, on one side of a glass sheet, of a complete solid electrochromic stack comprising successively - a first layer of a transparent conductive oxide (TCO1), a layer of a cathodic-colored inorganic electrochromic material, called an electrochromic electrode (EC), a layer of an ionic conductive inorganic solid electrolyte (IC), a layer of a cation intercalation material, referred to as a counter-electrode (CE), and a second layer of a transparent conductive oxide (TCO2), (b) the heat treatment of this complete electrochromic stack, at least five mineral layers, by irradiation with radiation having a wavelength of between 500 and 2000 nm, said radiation coming from a radiation device placed opposite the electrical stack rochrom, a relative movement being created between said radiation device and said substrate so as to bring the electrochromic stack to a temperature at least equal to 300 ° C for a short time, preferably less than 100 milliseconds. The five mineral layers (TCO1 / EC / CI / CE / TCO2) enumerated above are the only functional layers essential for the proper functioning of the electrochromic glazing. The glass sheet supporting the electrochromic stack may be in contact with the first or second transparent conductive oxide layer. Preferably, it is in contact with the first transparent conductive oxide layer (TCO1).
    [0004] The electrochromic stack may comprise other useful layers, which are not, however, indispensable for obtaining electrochromic behavior. It may for example comprise, between the glass substrate and the adjacent TCO layer, a barrier layer, known to prevent for example the migration of sodium ions. The stack may also comprise one or more antireflection layers comprising for example an alternation of transparent layers with high index and low refractive index, or one or more layers covering the upper TCO layer and serving to protect the stack against scratches and / or humidity.
    [0005] The first part of the process according to the present invention, namely the production of the electrochromic stack, comprises a succession of steps known as such (see, for example, EP 1 696 261 in the name of the Applicant). ).
    [0006] The glass substrate used is typically float glass, optionally cut, polished and washed. The set of mineral layers of the stack is preferably deposited by cathode sputtering, reactive or otherwise, assisted by magnetic field, generally in the same vacuum installation.
    [0007] Materials that can serve as transparent conductive oxides for the two TCO layers are known. Examples of these are indium oxide, mixed tin-indium oxide, tin oxide, doped tin oxide, zinc oxide, doped zinc oxide, ruthenium oxide, doped ruthenium oxide and zinc oxide doped with aluminum and / or gallium. The mixed tin-indium oxide (ITO) or zinc oxide doped with aluminum and / or gallium is preferably used. The thickness of each of the TCO layers is preferably between 10 and 1000 nm, preferably between 50 and 800 nm. The electrochromic mineral material with cathodic coloration of the electrochromic electrode EC is preferably tungsten oxide (W0x). hydrogenated and / or lithiated and / or nitrided, or an oxide, nitrided or not, doped with one or more transition metals, such as Nb, Zr, Ti, hydrogenated and / or lithiated. It is a so-called intercalation material capable of reversibly inserting a large number of cations into its mineral structure. This material is advantageously deposited directly on the first TCO layer in a thickness preferably between 100 nm and 2 μm, in particular between 200 nm and 1000 nm. On this electrochromic layer is then deposited the solid electrolyte. Solid inorganic electrolytes having suitable cationic conductivity are known. Examples of preferred materials that may be used as ionic conductor (IC) in the present invention are those selected from the group consisting of silica (SiO 2), tantalum oxide (Ta 2 O 5), and niobium oxide (Nb2O5). The layer IC may also be an oxide and / or nitride or oxy-nitride of the general formula MOxHyN, or M is a transition metal or a mixture of several elements chosen from Ta, Si, Al, Nb, Zr, Ti and Bi. The IC layer can also be replaced by an interfacial region.
    [0008] The thickness of the electrolyte layer is preferably between about 10 nm and 70 nm, particularly between 20 nm and 60 nm. In the next step, a second cation intercalation material is deposited as a counter electrode (CE) on the solid electrolyte. When the cations used are lithium ions, this intercalation material is preferably the mixed oxide of tungsten and nickel (NiWO). It can also be a compound of formula NiOxLyN, Mw, hydrated or not, or M is a transition metal or a mixture of transition metals. When using a proton system, iridium oxide or nickel oxide, whether hydrated or not, or a mixture thereof is preferably used as the intercalation material of the counterelectrode. The thickness of the counter-electrode is generally between 50 nm and 600 nm, in particular between 150 nm and 250 nm. When the cations exchanged, via the solid electrolyte, between the electrochromic material and the counter-electrode are lithium ions, it is necessary to then proceed to the introduction of lithium into the electrochromic stack. This can be done by sputtering a layer of lithium metal on the layer of the counter-electrode. The penetration of the lithium ions in the material of the counter-electrode, the electrolyte and the electrochromic material will be during the final annealing, in the oven and / or by irradiation.
    [0009] When the cations exchanged, via the solid electrolyte, between the electro-chromium material and the counter-electrode are protons, it performs the corresponding magnetron deposition steps by introducing hydrogen into the plasma. Then, finally, a second TCO layer is deposited, typically substantially identical to that of the first TCO layer. In one embodiment of the process of the present invention, the substrate carrying the complete electrochromic stack is subjected immediately after the deposition of the last TCO layer (TCO1 or TCO2) at the heat treatment stage. by irradiation. In other words, the substrate carrying the complete electrochromic stack is not previously subjected to a thermal annealing step in an annealing furnace. In another embodiment, the heat treatment step is carried out on the annealed electrochromic substrate. In other words, in this embodiment, the formation of a complete solid electrochromic stack comprises a final annealing step of a few minutes, typically from 1 to 5 minutes, in an annealing furnace at a temperature of between 350 ° C. and 450 ° C. ° C, in particular between 370 ° C and 410 ° C.
    [0010] The first embodiment (without prior annealing) is particularly interesting from an energy point of view and results in a significant shortening of the manufacturing process. The second embodiment (with prior annealing) is interesting because it makes it possible to obtain stacks with conductivities of the TCO layers which are particularly high, which partly explains the acceleration of the staining / fading process of the glazing. According to a preferred embodiment, the radiation device is a laser, preferably a laser emitting a laser beam, forming at the level of the electrochromic stack to be treated, a line covering the entire width of the electrochromic stack. The laser radiation is preferably generated by modules comprising one or more laser sources as well as optical shaping and redirection. Laser sources are typically laser diodes or fiber lasers, including fiber, diode or disk lasers. The laser diodes make it possible to economically achieve high power densities with respect to the electric power supply, for a small space requirement. The size of the fiber lasers is even smaller, and the linear power obtained can be even higher, but at a higher cost. Fiber lasers are understood to mean lasers in which the location of generation of the laser light is spatially offset from its place of delivery, the laser light being delivered by means of at least one optical fiber. In the case of a disk laser, the laser light is generated in a resonant cavity in which the transmitter medium is in the form of a disk, for example a thin disk (d). about 0.1 mm thick) to Yb: YAG. The light thus generated is coupled in at least one optical fiber directed towards the treatment site. Fiber or disk lasers are preferably optically pumped with laser diodes. The radiation from the laser sources is preferably continuous. The wavelength of the laser radiation is in a range from 500 to 2000 nm, preferably from 700 to 1100 nm, in particular from 800 to 1000 nm. Power laser diodes emitting at one or more wavelengths selected from 808 nm, 880 nm, 915 nm, 940 nm or 980 nm have proved particularly suitable. In the case of a disk laser, the wavelength is, for example, 1030 nm (emission wavelength for a Yb: YAG laser). For a fiber laser, the wavelength is typically 1070 nm.
    [0011] In the case of non-fiber lasers, the shaping and redirecting optics preferably include lenses and mirrors, and are used as means for positioning, homogenizing and focusing the radiation. The purpose of the positioning means is, where appropriate, to arrange the radiation emitted by the laser sources in a line. They preferably include mirrors. The aim of the homogenization means is to superpose the spatial profiles of the laser sources in order to obtain a homogeneous linear power along the line. The homogenizing means preferably comprise lenses allowing the separation of the incident beams into secondary beams and the recombination of said secondary beams into a homogeneous line. The means for focusing the radiation make it possible to focus the radiation on the electrochromic stack to be treated, in the form of a line of desired length and width. The focusing means preferably comprise a focusing mirror or a converging lens. In the case of fiber lasers, the shaping optics are preferably grouped in the form of an optical head positioned at the output of the optical fiber or each optical fiber.
    [0012] The optical shaping of said optical heads preferably comprise lenses, mirrors and prisms and are used as means of transformation, homogenization and focusing of the radiation.
    [0013] The transformation means comprise mirrors and / or prisms and serve to transform the circular beam, obtained at the output of the optical fiber, into a non-circular, anisotropic, line-shaped beam. For this, the transformation means increase the quality of the beam along one of its axes (fast axis, or axis of the width I of the laser line) and reduce the quality of the beam according to the other (slow axis, or axis the length L of the laser line). The homogenization means superimpose the spatial profiles of the laser sources in order to obtain a homogeneous linear power along the line. The homogenizing means preferably comprise lenses 15 for separating incident beams into secondary beams and recombining said secondary beams into a homogeneous line. Finally, the means for focusing the radiation make it possible to focus the radiation at the level of the working plane, that is to say in the plane of the electrochromic stack to be treated, in the form of a line of length 20 and desired width. The focusing means preferably comprise a focusing mirror or a converging lens. When only one laser line is used, the length of the line is advantageously equal to the width of the substrate. This length is typically at least 1 m, especially at least 2 m and in particular at least 3 m. It is also possible to use several lines, disjointed or not, but arranged so as to treat the entire width of the substrate. In this case, the length of each laser line is preferably at least 10 cm or 20 cm, especially in a range from 30 to 100 cm, especially from 30 to 75 cm, or even from 30 to 60 cm.
    [0014] The term "length" of the line is the largest dimension of the line, measured at the surface of the electrochromic stack, and "width" is the dimension in a second direction perpendicular to the first. As is usual in the field of lasers, the width (w) of the line corresponds to the distance, in this second direction, between the beam axis where the intensity of the radiation is maximum and the point where the intensity of the radiation is equal to 1 / e2 times the maximum intensity. If the longitudinal axis of the laser line is named x, we can define a width distribution along this axis, named w (x). The average width of the or each laser line is preferably at least 35 microns, especially in a range from 40 to 100 microns or 40 to 70 microns. Throughout this text we mean by "average" the arithmetic mean. Throughout the length of the line, the width distribution is narrow in order to limit as much as possible any heterogeneity of treatment. Thus, the difference between the largest width and the smallest width is preferably at most 10% of the average width value. This figure is preferably at most 5% and even 3%.
    [0015] The shaping and redirecting optics, in particular the positioning means, can be adjusted manually or by means of actuators making it possible to adjust their positioning remotely. These actuators (typically motors or piezoelectric shims) can be manually controlled and / or adjusted automatically. In this latter case, the actuators will preferably be connected to detectors as well as to a feedback loop. At least a portion of the laser modules, or all of them, is preferably arranged in a sealed box, advantageously cooled, in particular ventilated, in order to ensure their thermal stability.
    [0016] The laser modules are preferably mounted on a rigid structure, called a "bridge", based on metal elements, typically made of aluminum. The structure preferably does not include a marble slab. The bridge is preferably positioned parallel to the conveying means so that the focal plane of the laser line remains parallel to the surface of the substrate to be treated. Preferably, the bridge comprises at least four feet, the height of which can be individually adjusted to ensure parallel positioning under all circumstances. Adjustment can be provided by motors located at each foot, either manually or automatically, in relation to a distance sensor. The height of the bridge can be adapted (manually or automatically) to take into account the thickness of the substrate to be treated, and thus ensure that the plane of the substrate coincides with the focal plane of the laser line.
    [0017] The linear power of the laser line is preferably at least 300 W / cm, preferably 350 or 400 W / cm, especially 450 W / cm, or even 500 W / cm and even 550 W / cm. It is even advantageously at least 600 W / cm, especially 800 W / cm or 1000 W / cm. The linear power is measured where the or each laser line is focused on the electrochromic stack. It can be measured by placing a power detector along the line, for example a power-meter calorimetric, such as in particular the power meter Beam Finder S / N 2000716 Coherent Inc. The power is advantageously distributed in a manner homogeneous over the entire length of the or each line. Preferably, the difference between the highest power and the lowest power is less than 10% of the average power. The energy density supplied to the electrochromic stack by the laser device is preferably at least 20 J / cm 2, or even at least 30 J / cm 2.
    [0018] According to a preferred embodiment, the radiation is derived from at least one Intense Pulsed Light (IPL) lamp, hereafter referred to as the flash lamp. Such flash lamps are generally in the form of glass or quartz tubes sealed and filled with a rare gas, provided with electrodes at their ends. Under the effect of a short-term electrical pulse, obtained by discharging a capacitor, the gas ionizes and produces a particularly intense incoherent light. The emission spectrum generally comprises at least two emission lines; it is preferably a continuous spectrum having a maximum emission in the near ultraviolet.
    [0019] The lamp is preferably a xenon lamp. It can also be a lamp with argon, helium or krypton. The emission spectrum preferably comprises several lines, especially at wavelengths ranging from 160 to 1000 nm.
    [0020] The duration of each light pulse is preferably in a range from 0.05 to 20 milliseconds, especially from 0.1 to 5 milliseconds. The repetition rate is preferably in a range from 0.1 to 5 Hz, in particular from 0.2 to 2 Hz.
    [0021] The radiation may be from several lamps arranged side by side, for example 5 to 20 lamps, or 8 to 15 lamps, so as to simultaneously treat a wider area. In this case, all lamps can emit flashes simultaneously. The or each lamp is preferably disposed transversely to the longer sides of the substrate. The or each lamp has a length preferably of at least 1 m in particular 2 m and even 3 m so as to be able to treat large substrates. The capacitor is typically charged at a voltage of 500 V to 500 kV. The current density is preferably at least 4000 A / cm 2. The total energy density emitted by the flash lamps, relative to the surface of the electrochromic stack, is preferably between 1 and 100 J / cm 2, in particular between 1 and 30 J / cm 2, or even between 5 and 20 J. / cm2. The high power densities and densities make it possible to heat the electrochromic stack very quickly at high temperatures.
    [0022] During step (b) of the process according to the invention, each point of the electrochromic stack is preferably heated to a temperature of at least 300 ° C., in particular 350 ° C. or even 400 ° C., and even 500 ° C or 600 ° C. The maximum temperature is normally reached when the point of the stack under the radiation device passes, for example beneath the laser line or under the flash lamp. At a given moment, only the points on the surface of the electrochromic stack located under the radiation device (for example under the laser line) and in its immediate vicinity (for example less than a millimeter) are normally at a temperature at least 300 ° C. For distances to the laser line (measured in the direction of travel) greater than 2 mm, especially 5 mm, including downstream of the laser line, the temperature of the electrochromic stack is normally at most 50 ° C. and even 40 ° C or 30 ° C.
    [0023] Each point of the electrochromic stack undergoes the heat treatment (or is brought to the maximum temperature) during a period advantageously in a range from 0.05 to 10 ms, in particular from 0.1 to 5 ms, or from 0.1 to 2 ms. In the case of laser line processing, this time is fixed both by the width of the laser line and by the relative speed of displacement between the substrate and the laser line. In the case of a flash lamp treatment, this duration corresponds to the duration of the flash. The flash lamp device can be installed inside the vacuum deposition system or outside in a controlled atmosphere or in ambient air. The laser radiation is partly reflected by the electrochromic stack to be processed and partly transmitted through the substrate. For safety reasons, it is preferable to have in the path of these reflected and / or transmitted radiation means for stopping the radiation. It will typically be metal housings cooled by fluid circulation, especially water. In order to prevent the reflected radiation from damaging the laser modules, the propagation axis of the or each laser line forms an angle that is preferentially non-zero with the normal to the substrate, typically an angle of between 5 and 20 °.
    [0024] In order to enhance the efficiency of the treatment, it is preferable that at least a portion of the (main) laser radiation transmitted through the substrate and / or reflected by the electrochromic stack is redirected towards said substrate to form at least one secondary laser radiation, which preferably impacts the substrate at the same location as the main laser radiation, with preferably the same depth of focus and the same profile. The formation of the or each secondary laser radiation advantageously implements an optical assembly comprising only optical elements chosen from mirrors, prisms and lenses, in particular an optical assembly consisting of two mirrors and a lens, or 30 d a prism and a lens. By recovering at least a portion of the lost main radiation and redirecting it to the substrate, the heat treatment is considerably improved. The choice to use the part of the main radiation transmitted through the substrate ("transmission" mode) or the part of the main radiation reflected by the electrochromic stack ("reflection" mode), or possibly to use both, depends on the nature of the layer and the wavelength of the laser radiation. When the substrate is in displacement, in particular in translation, it can be set in motion by any mechanical means of conveying, for example by means of strips, rollers, plates in translation. The conveyor system controls and controls the speed of travel. The conveying means preferably comprises a rigid frame and a plurality of rollers. The pitch of the rollers is advantageously in a range from 50 to 300 mm. The rollers preferably comprise metal rings, typically made of steel, covered with plastic bandages. The rollers are preferably mounted on low-clearance bearings, typically three rolls per step. In order to ensure perfect flatness of the conveying plane, the positioning of each of the rollers is advantageously adjustable. The rollers are preferably driven by means of pinions or chains, preferably tangential chains, driven by at least one motor. The speed of the relative displacement movement between the substrate and the or each radiation source (in particular the or each laser line) is advantageously at least 2 m / min or 4 m / min, in particular 5 m / min and even 6 m / min. m / min or 7 m / min, or 8 m / min and even 9 m / min or 10 m / min. According to some embodiments, particularly when the radiation absorption by the electrochromic stack is high or when the electrochromic stack can be deposited with high deposition velocities, the velocity of the relative displacement movement between the substrate and the radiation source (especially the or each laser line or flash lamp) is at least 12 m / min or 15 m / min, including 20 m / min and even 25 or 30 m / min. In order to ensure a treatment that is as homogeneous as possible, the speed of the relative displacement movement between the substrate and the or each radiation source (in particular the or each laser line or flashlamp) varies during the treatment of at most 10% in relative terms, in particular 2% and even 1% compared to its nominal value.
    [0025] Preferably, the or each radiation source (in particular laser line or flashlamp) is fixed, and the substrate is in motion, so that the relative speeds of movement will correspond to the speed of travel of the substrate.
    [0026] Another alternative, used in the semiconductor or photo-voltaic industry, is to leave the substrate fixed and to scan the surface with the laser beam or to move the substrate under a laser beam sweep. The invention is illustrated below using non-limiting exemplary embodiments. EXAMPLE 1 Laser Annealing of an Electrochromic All-Solid Proton Stack The following electrochromic stack is deposited on a Planilux® sheet of glass in a magnetron sputtering installation: Substrate: Planilux (100 mm x 100 mm × 2.1) mm) TCO1: ITO (500nm) 20 Electrochromic layer: IrOx (85nm) Solid electrolyte: VV03 (100nm) / Ta205 (200nm) Counter electrode: HxVV03 (400nm) TCO2: ITO (100nm) 25 The first layer of ITO is deposited at a temperature of 350 ° C. All other layers are deposited without heating, with the exception of TCO2 which is deposited at a temperature above 100 ° C. The samples according to the state of the art are not subjected to any final thermal annealing in the oven. Indeed, the furnace heating of such a proton electrochromic stack would lead to a degradation, or even a loss, of the electrochromic behavior.
    [0027] The samples according to the invention are subjected to a rapid heat treatment by laser. For this, they are passed under a laser beam with a power of between about 1200 W and 1300 W (laser diode, 980 nm, CW mode) forming, at the level of the work plane, a line 100 mm long and 0.1 mm wide. The scroll speed is 10 m / minute. Table 1 below shows the colored and bleached light transmissions of the samples prepared with and without laser treatment as well as the square resistance (R1) of the last deposited ITO layer (TCO2).
    [0028] Table 1 TI-decolorized TI-colored Contrast R Without laser annealing 55% 2% 27.5% With laser annealing 63% 1.5% 42% It is found that the rapid laser heat treatment decreases. the resistance of the last deposited TCO2 (ITO) layer which results in an increase in the switching speed (staining / discoloration) of the samples. Contrary to what one might have thought, the laser heating of the complete electrochromic stack does not lead to a degradation of the electrochromic properties, but on the contrary an improvement in contrast is observed (TLdecolored / TLcolored). light transmission in the faded state is significantly increased, which is surprising and difficult to achieve in other ways.
    [0029] Accelerated aging tests at 80 ° C. show that the longevity of the stacks is the same for the samples according to the invention (treated with laser) and the comparative samples (without final heat treatment). Improvements due to laser processing (R 1 and switching speed) are maintained throughout the accelerated aging test.
    [0030] This example thus shows that the rapid laser heat treatment of an all solid electrochromic proton stack makes it possible to improve the contrast and the switching speed of the obtained electrochromic glazing.
    [0031] EXAMPLE 2 Laser Annealing of an Electrochromic All-Solid Lithium Stack The following electrochromic stack is deposited on a Planilux® glass sheet in a magnetron sputtering plant: Substrate: Planilux (100 mm x 100 mm × 2) , 2 mm) Anti-reflective coating TCO1: ITO (350 nm) Electrochromic layer: W03 (350 nm) Solid electrolyte: SiOx (30 nm) Counter-electrode: NiVVOx (250 nm) TCO2: ITO (400 nm) Anti-reflective coating 20 part of the samples is then subjected to thermal annealing in an oven (2 minutes at 400 ° C). Another part of the samples is not subject to thermal annealing. These samples are used as is for the evaluation of their electrochromic behavior.
    [0032] A portion of each of these sample batches (with and without thermal annealing in a furnace) is then subjected to rapid laser heat treatment under the following conditions: Laser source: 980 nm laser diodes, CW mode 30 Laser power: approximately 1400 W Scrolling speed: 10 m / m in The laser beam forms at the level of the working plane a laser line with a length of 100 mm and a width of 0.1 mm.
    [0033] Table 2 collates the light transmittance (TL) values in the colored and discolored state, the contrast and the square resistance (R 1) of the comparative samples (with and without oven annealing) and samples according to US Pat. invention (with or without prior oven annealing).
    [0034] Table 2 Comparative Samples Samples according to the invention (without laser annealing) (with laser annealing) TLdecolored TI-colored ContraR TL -decolored TI-colored Contr R ^ Without annealing 42% 24% 1.75 18 4 / ^ 65% 1 , 6.46 6.4% If with annealing 65% 1.6% 40 6.5% 66% 1.8 37 5.7% It is found that in terms of contrast, the samples according to The invention obtained after laser annealing is equivalent to the samples according to the state of the oven-annealed technique. Rapid laser annealing, which is faster than oven annealing, can therefore advantageously replace this one in a production line. It is furthermore observed that the square resistance of the samples subjected to rapid laser annealing is substantially reduced compared to the comparative samples, even when these have been previously subjected to oven annealing. This reduction of the R ^ results in an increase in the switching speed of the glazings obtained, in particular the coloring speed. Table 3 below shows the staining time (coloring) and discoloration (Tdécoloration) of the samples of Table 2. TABLE 3 Comparative Samples Samples according to the invention (without laser annealing) (with laser annealing) Coloring Técoration Coloring Técoration Técoration Without annealing oven> 18 min> 10 min 38 seconds 22 seconds With annealing oven 37 seconds 21 seconds 28 seconds 18 seconds
    权利要求:
    Claims (10)
    [0001]
    REVENDICATIONS1. A method of manufacturing an electrochromic glazing comprising the steps of: (a) forming, on one side of a glass sheet, a complete solid electrochromic stack comprising successively - a first layer of a transparent conductive oxide ( TCO1), - a layer of cathodic-colored mineral electrochromic material, called an electrochromic electrode (EC), - a layer of an inorganic ionic conductive solid electrolyte (IC), - a layer of a cation intercalation material , called counter-electrode (CE), and - a second layer of a transparent conductive oxide (TCO2), (b) the heat treatment of the complete electrochromic stack by irradiation with radiation having a wavelength of between 500 and 2000 nm, said radiation being derived from a radiation device placed opposite the electrochromic stack, a relative displacement being created between said radiation device and said substrate and so as to bring the electrochromic stack to a temperature at least 300 ° C for a short time, preferably less than 100 milliseconds.
    [0002]
    2. Method according to claim 1, characterized in that the formation of a complete solid electrochromic stack comprises a final annealing step in an annealing furnace, preferably at a temperature between 350 and 450 ° C, in particular between 370 and 410 ° C.
    [0003]
    The method of claim 1 or 2, wherein the transparent conductive oxide forming the transparent conductive oxide layers TCO1 and TCO2 is selected from the group consisting of tin-indium mixed oxide (ITO). and zinc oxide doped with aluminum and / or gallium. 3031197 20
    [0004]
    4. A method according to any one of the preceding claims, wherein the electrochromic cathodic-colored electrochromic material of the EC electrochromic electrode is tungsten oxide (W0x).
    [0005]
    5. A process according to any one of the preceding claims wherein the cation intercalation material of the counter-electrode (CE) is selected from the group consisting of tungsten-nickel mixed oxide (NiWO) and iridium oxide.
    [0006]
    6. A process according to any one of the preceding claims wherein the inorganic conductive inorganic electrolyte (IC) is selected from the group consisting of silica (SiO 2), tantalum oxide (Ta 2 O 5) and oxide of niobium (Nb2O5).
    [0007]
    7. Method according to one of the preceding claims, wherein the temperature of the face of said substrate opposite said first face does not exceed 100 ° C or 50 ° C, and especially 30 ° C, during the heat treatment.
    [0008]
    8. Method according to one of the preceding claims, wherein the radiation device is a laser, preferably a laser emitting a laser beam forming at the level of the electrochromic stack a line covering the entire width of the electrochromic stack. 20
    [0009]
    9. Method according to one of claims 1 to 7, wherein the radiation device is a flash lamp.
    [0010]
    10. A method according to any one of the preceding claims, wherein the deposition of all the thin layers of the electrochromic stack is performed by magnetic field assisted sputtering.
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    同族专利:
    公开号 | 公开日
    EP3241068A1|2017-11-08|
    US10739656B2|2020-08-11|
    CN107111198A|2017-08-29|
    PL3241068T3|2019-02-28|
    JP6741669B2|2020-08-19|
    DK3241068T3|2019-01-21|
    FR3031197B1|2017-06-16|
    ES2702994T3|2019-03-06|
    EP3241068B1|2018-09-26|
    WO2016108000A1|2016-07-07|
    US20180004058A1|2018-01-04|
    JP2018502331A|2018-01-25|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    US20110135837A1|2005-10-11|2011-06-09|Mark Samuel Burdis|Electrochromic devices having improved ion conducting layers|
    FR2911130A1|2007-01-05|2008-07-11|Saint Gobain|Treating continuous electroconductive thin layer deposited on first face of substrate e.g. silico-sodo-calcic glass, by altering each point of the thin layer to a specified temperature, and increasing a crystallization rate of the layer|WO2019028287A1|2017-08-04|2019-02-07|Vitro Flat Glass Llc|Flash annealing of transparent conductive oxide and semiconductor coatings|FR2833107B1|2001-12-05|2004-02-20|Saint Gobain|ELECTRODE OF ELECTROCHEMICAL / ELECTROCOMMANDABLE DEVICES|
    EP1631992A2|2003-06-12|2006-03-08|Patterning Technologies Limited|Transparent conducting structures and methods of production thereof|
    US7372610B2|2005-02-23|2008-05-13|Sage Electrochromics, Inc.|Electrochromic devices and methods|
    JP2011187336A|2010-03-09|2011-09-22|Sumitomo Chemical Co Ltd|Reforming method of transparent conductive film and method of manufacturing substrate with transparent conductive film|
    FR2989388B1|2012-04-17|2019-10-18|Saint-Gobain Glass France|PROCESS FOR OBTAINING A SUBSTRATE WITH A COATING|
    FR3002768B1|2013-03-01|2015-02-20|Saint Gobain|PROCESS FOR THERMALLY TREATING A COATING|
    CN203838454U|2014-04-10|2014-09-17|吉林大学|WO3-Ta2O5-NiO solid state composite electrochromism glass device|FR3088850B1|2018-11-28|2020-12-11|Saint Gobain|PROCESS FOR MANUFACTURING AN ELECTROCHROME WINDOW|
    FR3105459A1|2019-12-20|2021-06-25|Saint-Gobain Glass France|THERMAL TEMPERING OF A WORK ELECTRODE|
    FR3105212A1|2019-12-20|2021-06-25|Saint-Gobain Glass France|Process for rapid thermal treatment of thin films on tempered glass substrates|
    法律状态:
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    2016-07-01| PLSC| Search report ready|Effective date: 20160701 |
    2016-12-16| PLFP| Fee payment|Year of fee payment: 3 |
    2017-12-21| PLFP| Fee payment|Year of fee payment: 4 |
    2019-12-13| PLFP| Fee payment|Year of fee payment: 6 |
    2021-09-10| ST| Notification of lapse|Effective date: 20210806 |
    优先权:
    申请号 | 申请日 | 专利标题
    FR1463473A|FR3031197B1|2014-12-31|2014-12-31|METHOD FOR RAPID THERMAL TREATMENT OF A COMPLETE SOLID ELECTROCHROME STACK|FR1463473A| FR3031197B1|2014-12-31|2014-12-31|METHOD FOR RAPID THERMAL TREATMENT OF A COMPLETE SOLID ELECTROCHROME STACK|
    PL15823619T| PL3241068T3|2014-12-31|2015-12-08|Fast heat treatment method for a complete all-solid-state electrochromic stack|
    PCT/FR2015/053382| WO2016108000A1|2014-12-31|2015-12-08|Fast heat treatment method for a complete all-solid-state electrochromic stack|
    DK15823619.0T| DK3241068T3|2014-12-31|2015-12-08|PROCEDURE FOR FAST HEAT TREATMENT OF A COMPLETE THROUGH FIXED ELECTROCHROME LAMINATE|
    JP2017535029A| JP6741669B2|2014-12-31|2015-12-08|Rapid thermal processing method for complete all-solid-state electrochromic stacks|
    EP15823619.0A| EP3241068B1|2014-12-31|2015-12-08|Fast heat treatment method for a complete all-solid-state electrochromic stack|
    CN201580071655.0A| CN107111198A|2014-12-31|2015-12-08|Quick heat treatment method for complete full-solid electrochromic stacked body|
    ES15823619T| ES2702994T3|2014-12-31|2015-12-08|Rapid thermal treatment procedure of a complete solid electrochromic stacking|
    US15/540,793| US10739656B2|2014-12-31|2015-12-08|Fast heat treatment method for a complete all-solid-state electrochromic stack|
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