• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    The invention relates to a method for manufacturing a watchmaking micromechanical component from a silicon-based substrate (1), comprising, in order, the steps of: a) providing a substrate for silicon base (1), b) forming pores (2) on the surface of at least a portion of a surface of said silicon-based substrate (1) having a depth of at least 10 μm, preferably at least 50 microns, and more preferably at least 100 microns, said pores being arranged to lead to the outer surface of the watch micromechanical component. The invention also relates to a watchmaking micromechanical component comprising a silicon-based substrate (1) which has, on the surface of at least a portion of a surface of said silicon-based substrate (1), pores (2) of a depth of at least 10 microns, preferably at least 50 microns, and more preferably at least 100 microns, said pores being arranged to lead to the outer surface of the watch micromechanical component.
    公开号:CH711501A2
    申请号:CH01288/15
    申请日:2015-09-08
    公开日:2017-03-15
    发明作者:Dubois Philippe
    申请人:Nivarox-Far S A；
    IPC主号:
    专利说明:

    Field of the invention
    The present invention relates to a method for producing micromechanical watch parts based on silicon. The invention also relates to a reinforced micromechanical watchmaking component, based on silicon, which can in particular be obtained by such a method.
    Background of the invention
    [0002] Silicon is a material increasingly used in the manufacture of micromechanical watchmaking parts, in particular parts that remain connected to a silicon-based substrate on which they have been machined.
    [0003] Compared to the metals or alloys conventionally used to manufacture micromechanical watchmaking parts, such as gears, or the components of the exhaust, silicon has many advantages. It is a very hard material, of a very light weight which allows it to present a very reduced inertia and consequently to improve the yield. Silicon also makes it possible to produce complex parts, or monobloc.
    In order to improve or modify the properties of silicon, it is known to deposit on the silicon a layer of a suitable material. Thus, to improve its tribological properties, silicon is deposited on the diamond, for example by a thin-layer vapor phase deposition (CVD / PVD) method.
    However, these methods have a deposition rate which can be too slow when the thickness of the deposited layer exceeds a few microns. Indeed, the deposition rates in CVD machines for example being typically of the order of ten nanometers / minute, this technique is generally not used for the manufacture of a layer greater than a few microns.
    It is therefore necessary to provide a method of manufacturing a micromechanical watchmaking component based on silicon for rapid deposition of thick layers of a suitable material on the silicon.
    Furthermore, substrates based on silicon can be used to make dials.
    [0008] The dials of watches or other timepieces have inscriptions or decorative surfaces to give indications or highlight the dial. These decorations are traditionally made by different engraving techniques.
    When the dial is made of silicon, it is necessary to propose new techniques for making such inscriptions or decorative surfaces, easy to implement.
    Moreover, just like the other materials used more conventionally in the watch industry, parts made from a silicon-based substrate must be lubricated.
    It is known to use for example a very fluid lubricant which promotes a low coefficient of friction in the case of low contact pressures. However, this type of lubricant has the disadvantage of having its effect fade especially at higher contact pressures due to the rupture of the lubricant film. It is known that supra-lubrication techniques, based on the formation of surface-deposited polymer brushes (polymer brushes) and their impregnation with a lubricant having an affinity with polymeric brushes, greatly reduce friction for a wide range of applications. solicitations. These highly flexible polymer brushes straighten up when impregnated with lubricant, forming a sort of sponge full of lubricant. Depending on the friction regimes, during large contact pressures, the filaments can easily compress and return lubricant to the contact. This results in the formation of a larger lubricating film which results in a substantial decrease in the coefficient of friction and wear. However, during long-term solicitations, these polymer brushes eventually degrade (wear, tearing of the surface), which no longer allows the coating of polymer brushes to perform its function.
    It is therefore necessary to propose a new method for lubricating a micromechanical watch part based on silicon to contain on the surface of the part to be lubricated sufficient amounts of lubricating agent to reduce the frequency of maintenance services watch movement comprising said piece.
    It is also necessary to propose a new method for lubricating a micromechanical watch part based on silicon to create lubrication conditions allowing a significant reduction in wear and friction coefficient, so as to increase reliability, the yield and consequently the power reserve of the watch movement comprising this piece, and this for a wide range of requests.
    Summary of the invention
    For this purpose, the present invention relates to a method for manufacturing a watchmaking micromechanical component from a silicon-based substrate, comprising, in the order, the steps of:<tb> a) <SEP> get a silicon-based substrate<tb> b) <SEP> forming pores on the surface of at least a portion of a surface of said silicon-based substrate having a depth of at least 10 μm, preferably at least 50 μm, and more preferably at least 100 microns, said pores being arranged to lead to the outer surface of the watch micromechanical component.
    The method according to the invention makes it possible, by virtue of the prior formation of pores on the surface of the substrate, to improve various properties of a silicon-based substrate used in micromechanical watchmaking parts.
    The present invention also relates to a watchmaking micromechanical component capable of being obtained by the method as defined above.
    The present invention also relates to a watchmaking micromechanical component comprising a silicon-based substrate which has, on the surface of at least a portion of a surface of said silicon-based substrate, pores with a depth of at least 10 μm, preferably at least 50 μm, and more preferably at least 100 μm, said pores being arranged to lead to the outer surface of the watch micromechanical component.
    According to a first variant, the pores may be completely filled with a layer of a material chosen from diamond, carbon-diamond (DLC), silicon oxide, silicon nitride, ceramics, polymers and their mixtures, of a thickness at least equal to the depth of the pores. A surface layer of said material may be provided on the surface of the silicon-based substrate and pores filled with the material.
    According to another variant, the pores may be arranged to form a decorative surface, said decorative surface being covered with a coating comprising a metallization layer and / or a transparent oxide layer selected from the group comprising SiO 2, TiO 2. , ZrO 2, HfO 2, Ta 2 O 5, VO 2.
    In another variant, the pores may comprise a tribological agent. The part may then comprise, between the pores, silicon-based filaments, the silicon-based filaments comprising walls covered with at least one tribological agent wetting agent, the silicon-based filaments being impregnated with the tribological agent. The silicon-based filaments may also have walls covered with at least one polymeric brush, the silicon-based filaments and the polymeric brush being impregnated with the tribological agent.
    According to another variant, the pores may be arranged on the silicon-based substrate to form at least one epilam-effect superhydrophobic zone with respect to at least one zone of the silicon-based substrate that does not comprise a pore and on which is applied a tribological agent.
    Brief description of the drawings
    The objects, advantages and features of the present invention will appear more clearly in the following detailed description of various embodiments of the invention given solely by way of nonlimiting examples and illustrated by the appended drawings in which:<tb> figs. 1 to 3 <SEP> schematically illustrate the steps of a manufacturing method according to the invention,<tb> figs. 4 to 6 <SEP> schematically illustrate the steps of another variant of the manufacturing method according to the invention, and<tb> figs. 7 to 9 <SEP> schematically illustrate the steps of another variant of the manufacturing method according to the invention.
    Detailed description of the invention
    The method of manufacturing a watchmaking micromechanical component from a silicon-based substrate according to the invention comprises, in the order, the steps of:<tb> a) <SEP> get a silicon-based substrate<tb> b) <SEP> forming pores from the surface of at least a portion of a surface of said silicon-based substrate having a depth of at least 10 μm, preferably at least 50 μm microns, and more preferably at least 100 microns, said pores being arranged to lead to the outer surface of the watch micromechanical component.
    The silicon-based substrate is chosen according to the watchmaking micromechanical component to be formed. The final shape of the silicon-based substrate according to the micromechanical watchmaking component to be manufactured is given before or after the implementation of the method of the invention. In the present invention, the term "silicon-based substrate" refers to both a silicon layer in a substrate and a silicon substrate. Preferably, as shown in FIG. 1, the silicon-based substrate 1 is a silicon wafer or an SOI wafer (Silicon-on-Insulator). The pores may be formed both on the surface parallel to the plane of the substrate and on the surface perpendicular to the plane of the substrate.
    Advantageously, this step b) can be carried out by a method chosen from the group comprising an electrochemical etching process, a "Stain-etch" type method, and a "MAC-Etch" type process. .
    The electrochemical etching process may be an electrochemical anodizing process. Its implementation requires the use of an electrochemical bath containing hydrofluoric acid in aqueous solution or mixed with ethanol in concentrations of 1 to 10%. Electrical current and electrodes are needed to create electrochemical conditions inducing silicon attack. Depending on the electrochemical conditions, different types of pores can be obtained. Such a method is known to those skilled in the art and does not require detailed information here.
    The "Stain-etch" type process is based on a wet etching of silicon resulting directly in the formation of porous silicon. Typically, the attack is with an HF / HNO 3 / H 2 O solution with a HF: HNO 3 ratio of 50-500: 1. This method has the advantage of not requiring electrical input into the bath. Such a method is known to those skilled in the art and does not require detailed information here.
    Preferably, step b) is carried out by a method of the "MAC-Etch" type. This process is based on the use of noble metal particles to catalyze local chemical attack reactions. Typically, a very thin layer (10-50 nm) of a noble metal (gold, silver, platinum) is deposited and structured randomly or by lift-off, attack, laser, etc. Preferably, the noble metal is gold. More particularly, gold particles in solution in an HF / H2O2 mixture can advantageously be used. The particle size may be between 5 and 1000 nm. The structuring can be obtained by lithography of gold, attack or lift-off. Another option is evaporation or sputtering of a very thin, non-closed layer (5-30 nm). Heat treatment may contribute to the formation of islands of gold.
    When silicon with the noble metal layer is immersed in an aqueous solution of a HF / H2O2 mixture, the noble metal locally catalyzes the dissolution of silicon. This etching solution may typically comprise between 4 ml: 1 ml: 8 ml (48% HF: 30% H2O2: H2O) and 4 ml: 1 ml: 40 ml (48% HF: 30% H2O2: H2O). Silicon dissolution occurs preferentially under the metal, which then gradually sinks into the silicon. This reaction can be continued over great depths (> 100 mμ) according to propagation modes essentially influenced by the orientation of the silicon crystal, the surface arrangement, the doping and the bath chemistry. The method of "MAC-Etch" type has the advantage of not requiring electrical input into the bath while allowing the formation of very deep pores (> 100 mμ) in the silicon. It is therefore particularly suitable for the use, as a substrate, of SOI wafers generally used for the manufacture of watch components.
    Those skilled in the art know the parameters of the methods described above to implement so that the pores formed in the silicon-based substrate have an appropriate geometry and size.
    In particular, the pores may advantageously have an aspect ratio (depth: diameter ratio) of between 1 and 200.
    Preferably, the pores may have a depth greater than 200 microns and more preferably greater than 300 microns.
    As shown in FIG. 2, the formation of pores 2 in the silicon-based substrate 1 to a certain depth causes the formation, between the pores 2, of pillars 3 based on silicon on the same depth. Preferably, considering the silicon-based pillars as having a circular section, the pores 2 are formed so that the projected area of the pillars 3 based on silicon is less than 79% of the apparent total area so as not to have of silicon-based pillars touching each other.
    According to a first variant of the method of the invention, with reference to FIGS. 1 to 3, the porous silicon-based substrate is used to create a real substrate surface much larger than the initial surface, and therefore to greatly increase the apparent deposition rate of a suitable material.
    According to this first variant, the method according to the invention comprises, after step b), a step c) of completely filling the pores 2 formed in the silicon-based substrate 1 during step b) of a material selected from diamond, diamond-carbon (DLC), silicon oxide, silicon nitride, ceramics, polymers, and mixtures thereof, for forming a layer of said fiber material in the pores; a thickness at least equal to the depth of the pores.
    Thus, the method according to the invention makes it possible to manufacture, on the surface of the silicon-based substrate, a thick layer of a suitable material in a fast time, greatly reduced compared to a deposit on the flat surface of the substrate. a similar substrate, but not porous.
    This step c) is performed directly after step b), without any intermediate step, so that the material deposited in the pores is in direct contact with the walls of said pores.
    Preferably, step c) is carried out by a method chosen from the group comprising thin-film deposition processes, such as chemical vapor deposition (CVD), physical vapor deposition (PVD) methods. ), atomic thin layer deposition (ALD), and thermal oxidation. These methods are known to those skilled in the art and do not require detailed information here. It may be specified, however, that when step c) is performed by PVD deposition, the aspect ratio of the pores in the silicon-based substrate is preferably less than or equal to 4: 1. When step c) is performed by a CVD or MOCVD (metal organic chemical vapor deposition), the aspect ratio of the pores in the silicon-based substrate is preferably less than or equal to 50: 1. In addition, for a PVD deposit, the deposition rate will preferably be between 0.1 and 5 nm / s. For a CVD or MOCVD deposition, the deposition rate will preferably be between 0.01 and 10 nm / s. For an ALD deposit, the deposition rate will be, for example, 0.01 nm / s. Furthermore, thermal oxidation is particularly advantageous for reducing the proportion of silicon in a silicon substrate, the silicon being consumed by growth at about 50% of the thickness of the layer. Thus, one skilled in the art knows how to size the pores to be formed in a silicon substrate in order to allow 100% replacement of the silicon with SiO 2, thus resulting in the formation of a thick SiO 2 layer in a very short time. .
    Advantageously, the method according to the invention comprises after step c), a step d) of forming a surface layer 4 of said material on the surface of the substrate 1 and pores 2 filled with the material. More particularly, this surface layer 4 can be obtained by extending the deposition of the material according to step c) so as not only to completely fill the pores 2 of the material but also to then deposit said material on the pores 2 filled with the material and only on the pillars 3 to form a solid layer 4 of said material of thickness h0, as shown in FIG. 3. This gives a composite layer of thickness h1 comprising the pillars 3, the pores 2 filled with material and the solid layer 4. Thus, for example, a ratio h0 / h1 of the order of 10% may be obtained.
    Thus, the method according to the invention provides a watchmaking micromechanical component comprising a thick composite layer based on silicon / deposited material, or a thick layer of deposited material when all the silicon has been replaced.
    The formation of pores from the surface of the substrate during step b) makes it possible to create a very strong corrugation in order to create a real surface much greater than the initial surface, without pores. The person skilled in the art knows how to choose the geometry of the pores as well as the time of deposition of the material in the pores, in order to manufacture, on the silicon surface, a thick layer in a greatly reduced time with respect to a deposit on a flat surface. More particularly, those skilled in the art know how to choose the geometry and the size of the pores so as to:obtain a complete filling of the pores during the deposition of the material,facilitate the flow of gasesobtain the desired volume ratio between the deposited material layer and the silicon pores. For example, it is possible to manufacture porous silicon with a porosity of more than 90% if necessary.
    For example, for some deposition processes such as CVD and PVD, the deposition rate tends to be slower at the bottom of the pores. It is then possible to provide conical pores (wider in surface than in depth) to compensate for this phenomenon related to the flow of gases.
    Thus, with a sufficient gas supply in the pores, the method according to the invention makes it possible to obtain a silicon / deposited material composite layer of thickness h1 in a deposition time close to that necessary to obtain a solid layer of the material of thickness h0 corresponding to the surface layer 4.
    The method according to the invention can advantageously be implemented for the manufacture of silicon-based exhaust components, such as the escape wheel and the anchor, by forming thick layers of diamond by CVD. .
    The method according to the invention can also be implemented for the manufacture of silicon-based exhaust components, by forming thick layers of SiO 2, almost solid if the thermal oxidation process is used for the deposition. of SiO2.
    The method according to the invention can also be implemented to quickly create thick local layers deep in silicon, combining it with the structuring of porous silicon zones.
    According to a second variant of the method of the invention, the pores 2 are formed according to step b) on an area of the silicon-based substrate 1 corresponding to a decorative surface to be produced. The porous silicon-based substrate is then used to create on the micromechanical watchmaking part a decorative porous silicon surface of very dark color, close to black. The pores 2 are arranged so as to open on the outer surface of the watchmaking micromechanical component, so as to form a visible surface for the user.
    Those skilled in the art know the parameters of the methods described above to implement so that the pores formed in the silicon-based substrate have a geometry and a size appropriate to obtain a porous silicon zone having a very high high absorption capacity of light, especially in the visible range, and antireflection.
    In particular, by assimilating the pores, in the plane of the part, to orifices of circular section, said pores may preferably have a diameter of between 10 nm and 1000 nm.
    The color zone obtained is used as a decorative surface on the watchmaking micromechanical component. By decorative surface, for example means a drawing, a pattern or an inscription, such as numbers, or any other decor.
    The method according to the invention may optionally comprise, after step b), a step e) of depositing at least one coating on the porous silicon decorative surface obtained according to step b).
    Advantageously, this coating deposited in step e) may comprise a metallization layer based on at least one of the elements selected from the group consisting of Cr, Ti, Ag, Pt, Cu, Ni, Pd, Rh. Preferably, the metallization layer is a thin layer with a thickness of less than 50 nm.
    Advantageously, the coating deposited in step e) may also comprise a transparent oxide layer, such as one of the oxides chosen from the group comprising SiO 2, TiO 2, ZrO 2, HfO 2, Ta 2 O 5, VO 2, or their mixtures. The metallization layer or the oxide layer may be used alone, and may be deposited for example directly on the porous Si, or the two layers may be associated, the oxide layer then covering the metallization layer. The thickness of the oxide layer is preferably between 100 nm and 2000 nm.
    The coating of a metallization layer and a transparent oxide layer on the porous silicon decorative surface makes it possible to obtain a decorative surface of interferential colors.
    The method according to the invention can advantageously be implemented for the manufacture of silicon-based parts, such as dials.
    According to another variant of the method of the invention, the formation of pores from the surface of the silicon-based substrate makes it possible to form a porous silicon-based superstructure having a certain degree of flexibility capable of accommodating different pressure regimes by deforming. In addition, this type of structure has cavities that can contain a long lasting reserve of lubricant.
    In addition, in the case where polymeric brushes are deposited on the porous silicon-based superstructure, the coating obtained is able to gorge on lubricant and restore it when these polymer brushes are compressed. This coating also promotes the penetration of the lubricant into the cavities of the porous silicon-based superstructure.
    According to this variant, the pores 2 are formed from the surface of said silicon-based substrate 1 on an area of the silicon-based substrate 1 corresponding to an area to be lubricated by a tribological agent. The pores may preferably be formed on the surface perpendicular to the plane of the substrate, that is to say on the flanks of the micromechanical part which are in friction, but also on the surface parallel to the plane of the substrate.
    According to this variant, it is expected, after step b), a step f) of depositing in the pores 2, between the pillars 3, a tribological agent. The tribological agent is a lubricant, and can be liquid, for example in the form of an aqueous solution, or dry. In a preferred manner, said tribological agent is a perfluorocarbon polymer, such as polytetrafluoroethylene (PTFE), or any other appropriate tribological or lubricating agent.
    According to a first embodiment, the tribological agent is deposited according to step f) directly into the pores 2 of the silicon-based substrate. This step f) can be carried out by a thin-layer deposition process, such as CVD, iCVD, PECVD. A suitable heat treatment may be applied to polymerize the tribological agent at temperatures in the range of 100 ° C to 300 ° C. Thus, large amounts of tribological agent can be stored near the surface of the silicon-based substrate, while maintaining a relatively high apparent surface hardness due to silicon.
    In a particularly advantageous manner, the parameters of the process for forming the pores 2 in the silicon-based substrate 1 according to step b) are chosen so that the pores 2 have an appropriate geometry and size so that the pillars 3, formed between the pores 2, constitute filaments 3 based on silicon. These filaments 3 have an aspect ratio (ratio depth: diameter) of between 5 and 100. The filaments form a flexible superstructure and are then impregnated with a tribological agent chosen to facilitate the wetting of the pores, according to step b) the process according to the invention.
    A substrate comprising silicon-based filaments can be used according to two other embodiments of this variant of the process of the invention.
    [0063] More particularly with reference to FIGS. 4 to 6, according to a second embodiment, it is provided according to step b) to produce in a silicon-based substrate 1 pores 2 so as to form between the pores 2 of the pillars 3 in the form of filaments 3, as shown in FIG. 4. It is then expected between steps b) and f), a step g) of deposition of at least one wetting agent 6 of the tribological agent on the walls of the filaments 3 based on silicon. The wetting agent 6 is chosen to facilitate the wetting and penetration of the tribological agent. It is applied to form a very thin layer (a few nanometers) in order to functionalize the walls of the filaments 3 based on silicon. Then the filaments 3 are impregnated with a tribological agent 5, according to step f), the tribological agent being chosen to facilitate the wetting of the pores 2.
    [0064] Referring to FIGS. 7 to 9, according to a third embodiment, it is provided according to step b) to produce in a silicon-based substrate 1 pores 2 so as to form between the pores 2 of the pillars 3 in the form of filaments 3, as shown in FIG. 7. It is then provided between steps b) and f), a step h) depositing at least one polymer brush 8 on the walls of the filaments 3 based on silicon. Such a polymer brush 8 is described for example in the publications WO 2012 152 512 and WO 2014 009 059. The polymer brushes have filaments of shorter length than the silicon-based filaments so that the polymer filaments are protected by the Silicon filaments more mechanically resistant. Then, the silicon-based filaments 3 and the polymer brushes 8 are impregnated with a tribological agent 5, according to step f), the tribological agent being chosen to facilitate wetting.
    This variant of the method makes it possible to manufacture filaments directly in the silicon-based substrate material with controlled geometries and mechanical bending properties, which makes it possible, when using polymer brushes, to maintain the super-lubrication behavior. over a wide range of friction rates while increasing reliability. Thus, the process according to the invention overcomes the lack of mechanical strength of polymer brushes usually used in supra-lubrication. The structure formed of silicon-based filaments constitutes a lubricant reservoir capable of returning the sufficient amount of lubricant in the contact as a function of the stresses.
    The geometry of the pores and silicon-based filaments can be optimized depending on the friction regimes and tribological objectives referred to. Structuring of the silicon-based substrate can range from silicon-based filaments to open and disordered pores forming a spongy layer.
    According to another variant of the process of the invention, the pores 2 are formed on the silicon-based substrate 1 to form at least one epilam-effect superhydrophobic zone with respect to at least one zone of the silicon-based substrate. not including a pore and on which a tribological agent is applied. This effect can be reinforced by localized functionalization.
    权利要求:
    Claims (27)
    [1]
    1. A method for manufacturing a watch micromechanical component from a silicon-based substrate (1), comprising in the order, the steps of:a) providing itself with a silicon-based substrate (1),b) forming pores (2) on the surface of at least a portion of a surface of said silicon-based substrate (1) having a depth of at least 10 μm, preferably at least 50 μm, and more preferably at least 100 microns, said pores being arranged to lead to the outer surface of the watch micromechanical component.
    [2]
    2. A method according to claim 1, comprising after step b), a step c) of completely filling said pores (2) with a material selected from diamond, diamond-carbon (DLC), silicon, silicon nitride, ceramics, polymers and mixtures thereof, to form in the pores (2) a layer of said material having a thickness at least equal to the depth of the pores (2).
    [3]
    3. Method according to claim 2, comprising after step c), a step d) of forming a surface layer (4) of said material on the surface of the silicon-based substrate (1) and pores (2). ) filled with the material.
    [4]
    The method of claim 1, wherein the pores (2) are formed on an area of the silicon-based substrate (1) corresponding to a decorative surface.
    [5]
    5. Method according to claim 4, characterized in that it comprises, after step b), a step e) depositing at least one coating on the decorative surface.
    [6]
    6. Method according to claim 5, characterized in that the coating comprises a metallization layer.
    [7]
    7. Method according to one of claims 5 and 6, characterized in that the coating comprises a transparent oxide layer selected from the group consisting of SiO2> TiO2, ZrO2, HfO2, Ta2O5, VO2.
    [8]
    8. A method according to claim 1, comprising after step b), a step f) of depositing in said pores (2) a tribological agent (5), said pores (2) being formed on the surface of at least a part of a surface to be lubricated of said silicon-based substrate (1).
    [9]
    9. The method of claim 8, wherein the pores (2) are arranged to form, between the pores, filaments (3) based on silicon having an aspect ratio (depth: diameter ratio) between 5 and 100.
    [10]
    The method according to claim 8 or 9, comprising, between steps b) and f), a step g) of depositing at least one wetting agent (6) of the tribological agent (5) on the walls of the filaments (3) based on silicon.
    [11]
    11. The method of claim 8 or 9, comprising, between steps b) and f), a step h) depositing at least one polymer brush (8) on the walls of the filaments (3) based on silicon .
    [12]
    12. Method according to one of claims 8 to 11, wherein the tribological agent (5) is a perfluorocarbon polymer.
    [13]
    The method of claim 1, wherein the pores (2) are formed on the silicon-based substrate (1) to form at least one epilam-effect superhydrophobic zone with respect to at least one region of the silicon-based substrate. not including a pore and on which a tribological agent is applied.
    [14]
    14. Process according to one of claims 1 to 13, in which step b) is carried out by a process chosen from the group comprising an electrochemical etching process, a "Stain-etch" type process, and a method of type "MAC-Etch".
    [15]
    15. The method of claim 14, wherein step b) is performed by a method of "MAC-Etch" type.
    [16]
    16. Method according to one of the preceding claims, wherein the pores have an aspect ratio (depth: diameter ratio) of between 1 and 200.
    [17]
    17. Method according to one of the preceding claims, wherein the pores (2) have a depth greater than 200 microns and more preferably greater than 300 microns.
    [18]
    18. Method according to one of the preceding claims, wherein the silicon-based substrate (1) is a silicon wafer or a wafer SOI (Silicon-on-Insulator).
    [19]
    19. Clock micromechanical component obtainable by the method according to any one of claims 1 to 18.
    [20]
    20. Watch micromechanical part comprising a silicon-based substrate (1) which has, on the surface of at least a portion of a surface of said silicon-based substrate (1), pores (2) of a depth at least 10 μm, preferably at least 50 μm, and more preferably at least 100 μm, said pores being arranged to lead to the outer surface of the watch micromechanical component.
    [21]
    21. Part according to claim 20, characterized in that said pores (2) are completely filled with a layer of a material selected from diamond, diamond-carbon (DLC), silicon oxide, nitride silicon, ceramics, polymers and their mixtures, of a thickness at least equal to the depth of the pores (2).
    [22]
    22. Part according to claim 21, characterized in that it comprises a surface layer of said material on the surface of the silicon-based substrate (1) and pores (2) filled with the material.
    [23]
    23. Part according to claim 20, characterized in that the pores (2) are arranged to form a decorative surface, and in that said decorative surface is covered with a coating comprising a metallization layer and / or a transparent coating. oxide selected from the group consisting of SiO 2, TiO 2, ZrO 2, HfO 2, Ta 2 O 5, VO 2.
    [24]
    24. Part according to claim 20, characterized in that the pores (2) comprise a tribological agent (5).
    [25]
    25. Part according to claim 24, characterized in that it comprises, between the pores (2), filaments (3) based on silicon, the filaments (3) based on silicon having walls covered with at least one wetting agent (6) of the tribological agent (5), the filaments (3) based on silicon being impregnated with the tribological agent (5).
    [26]
    26. Part according to claim 24, characterized in that it comprises, between the pores (2), filaments (3) based on silicon, the filaments (3) based on silicon having walls covered with at least one polymer brush (8), the silicon-based filaments (3) and the polymer brush (8) being impregnated with the tribological agent (5).
    [27]
    27. Part according to claim 20, characterized in that the pores (2) are arranged on the silicon-based substrate (1) to form at least one superhydrophobic zone with epilam effect with respect to at least one zone of the substrate based on of silicon having no pore and on which a tribological agent is applied.
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    同族专利:
    公开号 | 公开日
    CH711501B1|2020-04-30|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    CH714550A1|2018-01-12|2019-07-15|Richemont Int Sa|A method of lubricating a watch exhaust.|
    法律状态:
    优先权:
    申请号 | 申请日 | 专利标题
    CH01288/15A|CH711501B1|2015-09-08|2015-09-08|Method for manufacturing a micromechanical timepiece and said micromechanical timepiece.|CH01288/15A| CH711501B1|2015-09-08|2015-09-08|Method for manufacturing a micromechanical timepiece and said micromechanical timepiece.|
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