• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    The invention relates to a method for manufacturing a watchmaking micromechanical component from a silicon-based substrate (1), comprising, in order, the steps of: a) forming pores (2) to the surface of at least a portion of a surface of said silicon-based substrate (1) of a given depth, b) completely filling said pores (2) with a material selected from diamond, diamond-carbon ( DLC), silicon oxide, silicon nitride, ceramics, polymers and mixtures thereof, to form in the pores (2) a layer of said material having a thickness at least equal to the depth of the pores (2). ). The invention also relates to a watchmaking micromechanical component comprising a silicon-based substrate (1) which has, on the surface of at least a portion of one of its surfaces, pores (2) of a determined depth, said pores (2) being entirely filled with a layer of a material selected from diamond, diamond-carbon (DLC), silicon oxide, silicon nitride, ceramics, polymers and mixtures thereof, a thickness at least equal to the depth of the pores (2).
    公开号:CH711498A2
    申请号:CH01285/15
    申请日:2015-09-08
    公开日:2017-03-15
    发明作者:Dubois Philippe
    申请人:Nivarox-Far S A；
    IPC主号:
    专利说明:

    Field of the invention
    The present invention relates to a method for producing reinforced micromechanical watch parts, based on silicon. The invention also relates to a reinforced micromechanical watchmaking component, based on silicon, which can in particular be obtained by such a method.
    Background of the invention
    [0002] Silicon is a material increasingly used in the manufacture of micromechanical watchmaking parts, in particular parts that remain connected to a silicon-based substrate on which they have been machined.
    [0003] Compared to the metals or alloys conventionally used to manufacture micromechanical watchmaking parts, such as gears, or the components of the exhaust, silicon has many advantages. It is a very hard material, of a very light weight which allows it to present a very reduced inertia and consequently to improve the yield. Silicon also makes it possible to produce complex parts, or monobloc.
    In order to improve or modify the properties of silicon, it is known to deposit on the silicon a layer of a suitable material. Thus, to improve its tribological properties, silicon is deposited on the diamond, for example by a thin-layer vapor phase deposition (CVD / PVD) method.
    However, these methods have a deposition rate which can be too slow when the thickness of the deposited layer exceeds a few microns. Indeed, the deposit rates in CVD machines for example being typically of the order of ten nanometers / minute, this technique is generally not used for the manufacture of a layer greater than a few microns.
    It is therefore necessary to provide a method of manufacturing a micromechanical watchmaking component based on silicon for rapid deposition of thick layers of a suitable material on the silicon.
    Summary of the invention
    For this purpose, the present invention relates to a method for manufacturing a watchmaking micromechanical component from a silicon-based substrate, comprising, in order, the steps of:<tb> a) <SEP> forming pores on the surface of at least a portion of a surface of said silicon-based substrate of a determined depth,<tb> b) <SEP> completely fill said pores with a material selected from diamond, diamond-carbon (DLC), silicon oxide, silicon nitride, ceramics, polymers and mixtures thereof, so as to forming in the pores a layer of said material having a thickness at least equal to the depth of the pores.
    The present invention also relates to a micromechanical watchmaker able to be obtained by the method as defined above.
    The present invention also relates to a watchmaking micromechanical component comprising a silicon-based substrate which has, on the surface of at least a portion of one of its surfaces, pores of a given depth, said pores being entirely filled with a layer of a material selected from diamond, diamond-carbon (DLC), silicon oxide, silicon nitride, ceramics, polymers and mixtures thereof, of a thickness at least equal to the depth of the pores.
    Advantageously, the part may comprise a surface layer of said material on the surface of the silicon-based substrate and pores filled with the material.
    The method according to the invention makes it possible, thanks to the prior formation of pores on the surface of the substrate, to create a real substrate surface much greater than the initial surface, and consequently to greatly increase the apparent deposition rate. of a suitable material. Thus, the method according to the invention makes it possible, on the surface of the silicon-based substrate, to manufacture a thick layer of a suitable material in a fast time, greatly reduced compared to a deposit on the flat surface of a similar substrate. but not porous.
    Brief description of the drawings
    The objects, advantages and features of the present invention will appear more clearly in the following detailed description of at least one embodiment of the invention given solely by way of non-limiting example and illustrated by the accompanying drawings in which: :- figs. 1 to 3 schematically illustrate the steps of a manufacturing method according to the invention.
    Detailed description of the invention
    The method of manufacturing a watchmaking micromechanical component from a silicon-based substrate according to the invention firstly comprises a step a) of pore formation of a determined depth, starting from the surface of at least a portion of a surface of said silicon-based substrate, said pores opening at the outer surface of the silicon-based substrate. The silicon-based substrate is chosen as a function of the watchmaking micromechanical component to be formed. The final shape of the silicon-based substrate according to the micromechanical watchmaking component to be manufactured is given before or after the implementation of the method of the invention. In the present invention, the term "silicon-based substrate" refers to both a silicon layer in a substrate and a silicon substrate. Preferably, as shown in FIG. 1, the silicon-based substrate 1 is a silicon wafer or an SOI wafer (Silicon-on-lnsulator). The pores may be formed both on the surface parallel to the plane of the substrate and on the surface perpendicular to the plane of the substrate.
    Advantageously, this step a) can be carried out by a method chosen from the group comprising an electrochemical etching process, a "Stain-etch" type method, and a "MAC-Etch" type process. .
    The electrochemical etching process may be an electrochemical anodizing process. Its implementation requires the use of an electrochemical bath containing hydrofluoric acid in aqueous solution or mixed with ethanol in concentrations of 1 to 10%. Electrical current and electrodes are needed to create electrochemical conditions inducing silicon attack. Depending on the electrochemical conditions, different types of pores can be obtained. Such a method is known to those skilled in the art and does not require detailed information here.
    The method of "Stain-etch" type is based on a wet etching of silicon resulting directly in the formation of porous silicon. Typically, the attack is carried out with a HF / HNO 3 / H 2 O solution with a HF: HNO 3 ratio of 50-500: 1. This method has the advantage of not requiring electrical input into the bath. Such a method is known to those skilled in the art and does not require detailed information here.
    Preferably, step a) is carried out by a method of the "MAC-Etch" type. This process is based on the use of noble metal particles to catalyze local chemical attack reactions. Typically, a very thin layer (10-50 nm) of a noble metal (gold, silver, platinum) is deposited and structured randomly or by lift-off, attack, laser, etc. Preferably, the noble metal is gold. More particularly, gold particles in solution in an HF / H2O2 mixture can advantageously be used. The particle size may be between 5 and 1000 nm. The structuring can be obtained by lithography of gold, attack or lift-off. Another option is evaporation or sputtering of a very thin, non-closed layer (5-30 nm). Heat treatment may contribute to the formation of islands of gold.
    When the silicon with the noble metal layer is immersed in an aqueous solution of a mixture HF / H2O2, the noble metal locally catalyzes the dissolution of silicon. This etching solution may typically comprise between 4 ml: 1 ml: 8 ml (48% HF: 30% H2O2: H2O) and 4 ml: 1 ml: 40 ml (48% HF: 30% H2O2: H2O). Silicon dissolution occurs preferentially under the metal, which then gradually sinks into the silicon. This reaction can be continued over great depths (> 100 mμ) according to propagation modes essentially influenced by the orientation of the silicon crystal, the surface arrangement, the doping and the bath chemistry. The method of "MAC-Etch" type has the advantage of not requiring electrical input into the bath while allowing the formation of very deep pores (> 100 mμ) in the silicon. It is therefore particularly suitable for the use, as a substrate, of SOI wafers generally used for the manufacture of watch components.
    Those skilled in the art know the parameters of the methods described above to implement so that the pores formed in the silicon-based substrate have an appropriate geometry and size.
    In particular, the pores may advantageously have an aspect ratio (depth: diameter ratio) less than or equal to 100: 1. In particular, when step b) is performed by PVD deposition, the aspect ratio of the pores in the silicon-based substrate is preferably less than or equal to 4: 1. When step b) is performed by a CVD or MOCVD (metal organic chemical vapor deposition), the aspect ratio of the pores in the silicon-based substrate is preferably less than or equal to 50: 1.
    [0021] Preferably, the pores may have a depth greater than 100 microns, preferably greater than 200 microns and more preferably greater than 300 microns.
    As shown in FIG. 2, the formation of pores 2 in the silicon-based substrate 1 to a certain depth causes the formation, between the pores 2, of pillars 3 based on silicon on the same depth. Preferably, considering the silicon-based pillars as having a circular section, the pores 2 are formed so that the projected area of the pillars 3 based on silicon is less than 79% of the apparent total area so as not to have of touching silicon-based pillars, which would stiffen the structure (this corresponds to the percolation threshold).
    The second step b) of the method according to the invention consists in completely filling the pores formed in the silicon-based substrate during step a), of a material selected from diamond, diamond-carbon ( DLC), silicon oxide, silicon nitride, ceramics, polymers and mixtures thereof, to form in the pores a layer of said material having a thickness at least equal to the depth of the pores.
    This second step b) is performed directly after step a), without any intermediate step, so that the material deposited in the pores is in direct contact with the walls of said pores.
    Preferably, step b) is carried out by a process chosen from the group comprising thin-film deposition processes, such as chemical vapor deposition (CVD), physical vapor deposition (PVD) methods. ), atomic thin layer deposition (ALD), and thermal oxidation. These methods are known to those skilled in the art and do not require detailed information here. It may be specified however that for a PVD deposit, the deposition rate will preferably be between 0.1 and 5 nm / s. For a CVD or MOCVD deposition, the deposition rate will preferably be between 0.01 and 10 nm / s. For an ALD deposit, the deposition rate will be, for example, 0.01 nm / s. Furthermore, thermal oxidation is particularly advantageous for reducing the proportion of silicon in a silicon substrate, the silicon being consumed by growth at about 50% of the thickness of the layer. Thus, one skilled in the art knows how to size the pores to be formed in a silicon substrate in order to allow 100% replacement of the silicon with SiO 2, thus resulting in the formation of a thick SiO 2 layer in a very short time. .
    Advantageously, the method according to the invention comprises after step b), a step c) of forming a surface layer of said material on the surface of the substrate and pores filled with the material. More particularly, this surface layer can be obtained by extending the deposition of the material according to step b) so as not only to completely fill the pores 2 of the material but also to then deposit said material on the pores 2 filled with the material as well as on the pillars 3 to form a solid layer 4 of said material of thickness h0, as shown in FIG. 3. This gives a composite layer of thickness h1 comprising the pillars 3, the pores 2 filled with material and the solid layer 4. Thus, for example, a ratio h0 / h1 of the order of 10% may be obtained.
    Thus, the method according to the invention provides a watch micromechanical component comprising a thick composite layer based on silicon / deposited material, or a thick layer of deposited material when all the silicon has been replaced.
    The formation of pores from the surface of the substrate during step a) makes it possible to create a very strong corrugation in order to create a real surface much greater than the initial surface, without pores. The person skilled in the art knows how to choose the geometry of the pores as well as the time of deposition of the material in the pores, in order to manufacture, on the silicon surface, a thick layer in a greatly reduced time with respect to a deposit on a flat surface. More particularly, those skilled in the art know how to choose the geometry and the size of the pores so as to:obtain a complete filling of the pores during the deposition of the material,facilitate the flow of gasesobtain the desired volume ratio between the deposited material layer and the silicon pores. For example, it is possible to manufacture porous silicon with a porosity of more than 90% if necessary.
    For example, for some deposition processes such as CVD and PVD, the deposition rate tends to be slower at the bottom of the pores. It is then possible to provide conical pores (wider in surface than in depth) to compensate for this phenomenon related to the flow of gases.
    Thus, with a sufficient gas supply in the pores, the process according to the invention makes it possible to obtain a silicon / deposited material composite layer of thickness h1 in a deposition time close to that necessary to obtain a solid layer of the material of thickness h0 corresponding to the surface layer 4.
    The method according to the invention can advantageously be implemented for the manufacture of silicon-based exhaust components, such as the escape wheel and the anchor, by forming thick layers of diamond by CVD. .
    The method according to the invention can also be implemented for the manufacture of silicon-based exhaust components, by forming thick layers of SiO 2, almost solid if the thermal oxidation process is used for the deposition. of SiO2.
    The method according to the invention can also be implemented to quickly create thick local layers deep in silicon, combining it with the structuring of porous silicon zones.
    权利要求:
    Claims (11)
    [1]
    A method of manufacturing a watchmaking micromechanical part from a silicon-based substrate (1), comprising, in order, the steps of:a) forming pores (2) on the surface of at least a portion of a surface of said silicon-based substrate (1) of a determined depth,b) completely filling said pores (2) with a material chosen from diamond, diamond-carbon (DLC), silicon oxide, silicon nitride, ceramics, polymers and their mixtures, so as to form in the pores (2) a layer of said material having a thickness at least equal to the depth of the pores (2).
    [2]
    2. Method according to claim 1, comprising after step b), a step c) of forming a surface layer (4) of said material on the surface of the silicon-based substrate (1) and pores (2). ) filled with the material.
    [3]
    3. Method according to one of claims 1 to 2, wherein step a) is carried out by a process selected from the group comprising an electrochemical etching process, a method of "Stain-etch" type, and a method of type "MAC-Etch".
    [4]
    4. The method of claim 3, wherein step a) is performed by a method of "MAC-Etch" type.
    [5]
    5. Method according to one of the preceding claims, wherein step b) is carried out by a method selected from the group comprising thin film deposition processes and thermal oxidation.
    [6]
    6. Method according to one of the preceding claims, wherein the pores have an aspect ratio (ratio depth: diameter) less than or equal to 100: 1.
    [7]
    7. Method according to one of the preceding claims, wherein the pores (2) have a depth greater than 100 microns, preferably greater than 200 microns and more preferably greater than 300 microns.
    [8]
    8. Method according to one of the preceding claims, wherein the silicon-based substrate (1) is a silicon wafer or a wafer SOI (Silicon-on-insulator).
    [9]
    Clock micromechanical component obtainable by the method according to any one of claims 1 to 8.
    [10]
    A watchmaking micromechanical component comprising a silicon-based substrate (1) having, on the surface of at least a portion of a surface of said silicon-based substrate (1), pores (2) of a depth determined, said pores (2) being fully filled with a layer of a material selected from diamond, diamond-carbon (DLC), silicon oxide, silicon nitride, ceramics, polymers and mixtures thereof , of a thickness at least equal to the depth of the pores (2).
    [11]
    11. Part according to claim 10, characterized in that it comprises a surface layer of said material on the surface of the silicon-based substrate (1) and pores (2) filled with the material.
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    EP3141522B1|2015-09-08|2018-05-02|Nivarox-FAR S.A.|Micromechanical timepiece part comprising a lubricated surface and method for manufacturing such a micromechanical timepiece part|
    EP3141520B1|2015-09-08|2018-03-14|Nivarox-FAR S.A.|Method for manufacturing a micromechanical timepiece part and said micromechanical timepiece part|
    法律状态:
    优先权:
    申请号 | 申请日 | 专利标题
    CH01285/15A|CH711498B1|2015-09-08|2015-09-08|Method for manufacturing a micromechanical timepiece and said micromechanical timepiece.|
    EP15184184.8A|EP3141519B1|2015-09-08|2015-09-08|Method for manufacturing a micromechanical timepiece part|CH01285/15A| CH711498B1|2015-09-08|2015-09-08|Method for manufacturing a micromechanical timepiece and said micromechanical timepiece.|
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