专利摘要:
method and device for producing color patterns using diffraction grids. the present invention relates to a method for creating color patterns for technical applications visible to the human eye by means of diffraction grids through the irradiation of light, the diffraction grating arrangements that are produced directly on a solid body surface in a laser microstructure process through at least one laser installation in the nanosecond range or in the peak or eye resolution ability and that contains at least one pixel (81,82,83) with a pixel being a limited diffraction network structure to produce a spectral color. the direct application of such color producing diffraction network structures on a solid body surface allows for a wide variety of decorative and authentication possibilities ranging from embossing tools to jewelry.
公开号:BR112012014869B1
申请号:R112012014869
申请日:2010-11-22
公开日:2020-01-21
发明作者:Boegli Charles
申请人:Boegli Gravures Sa;
IPC主号:
专利说明:

Descriptive Report of the Invention Patent for METHOD AND DEVICE FOR CREATING COLOR PATTERNS THROUGH DIFFRACTION NETWORKS AND METAL PACKAGING SHEET.
[0001] The present invention relates to a method and device for producing color patterns by means of diffraction grids, according to the preamble of claim 1. By definition, the term color pattern encompasses all types of modifications of a surface that produces a color, particularly in the human eye, and colors are usually, but not exclusively, mixed colors that are created by diffraction of polychromatic light in corresponding diffraction grids. Mixed colors or colors, respectively, can appear in structures, signs, logos or in specific applications as authentication characteristics.
[0002] The production of spectral colors, primary colors, and therefore mixed colors through network structures, has been known for a long time. As representative examples thereof, the reference WO 2006/066731 A1, WO 98/23979, or EP 0 585 966 A2 can be cited. All of these and other references of the prior art have in common that the network structures are produced by means of laser or electron beam lithography on a relatively soft synthetic substrate. These lithographic methods require multiple and partially complex process steps to produce the network structures that are well known from the literature.
[0003] This also applies to the optical network structure based on diffraction according to US publication 2006/0018021 A1, which reveals an elliptical structure.
[0004] Numerous fields of application are known where optical characteristics are used, which have to satisfy high aesthetic requirements, on the one hand, and serve for the authentication of
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2/20 products, on the other hand. One group of such applications is, for example, packaging metal foils for cigarettes, food or pharmaceutical products, such foils being generally embossed by means of embossing rolls; or the surface of a decorative object, for example, a part of a watch case, a glass or sapphire watch glass, or a coin may be the object. Particularly in packaging foils, colored patterns can gain increasing significance if the metallized layer were further reduced or omitted entirely. With regard to embossing tools or the aforementioned decorative objects, it is a metal surface that is being structured, and in the case of embossing tools, a layer of rigid material. This is, for example, disclosed in WO 2007/012215 A1 for the depositor of the present invention.
[0005] In this context, it is an object of the present invention to provide a method and device for creating lattice structures to produce color patterns that have a greater diffraction intensity and spectral colors of greater gloss and which are applied to the embossing tools, such as as embossing rolls or embossing dies, and from them for packaging metal sheets or decorative objects. This object is achieved through the method according to claim 1 and through the device according to claim 13.
[0006] The invention will be explained in more detail hereinafter with reference to the drawings of the exemplary modalities.
[0007] Figure 1 shows a schematic diagram of a device according to the invention provided with two laser installations to create diffraction grid arrangements directly on a solid body surface,
Figure 2 shows laser beam intensity formats
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3/20 using a combination of mask and diaphragm,
Figure 3 shows a preferred blazed mesh structure in a sectional view,
Figure 4 shows a first mask to create the shiny network structure of Figure 3,
Figure 5 shows a second mask to create the shiny network structure of Figure 3,
Figure 6 shows another diffraction network in the form of a column or blind hole network with well cross sections or triangular column,
Figure 7 shows a diffraction grid arrangement with the associated color pixels, and
Figure 8 shows a subarea that is no longer capable of being resolved to the human eye and is made up of a plurality of different color pixel areas.
[0008] In Figure 1, a device for producing diffraction grids with two laser installations is illustrated, of which the one on the left in the drawing is an excimer laser installation which is suitable for producing, for example, bright network arrangements and the laser installation on the right is a femto or picosecond laser installation that serves to create masks and / or diaphragms to produce the network structures, on the one hand, and on the other hand, is suitable or to produce network structures with directly acting undulation or to overlap the network structures produced by the excimer laser with a second network structure that is based on a variation in the spacing between the undulations.
[0009] The first L1 laser installation, which comprises an excimer KrF laser that has a wavelength of 248 nanometers (nm), serves to produce microstructures on the solid body surface according to the mask projection technique, and the second urges
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4/20 L2 laser lation, which comprises a femtosecond laser 15 which has a center wavelength of 775 nm or its doubled or tripled frequency wavelength, serves to produce either nanostructures, for example, network structures of waviness, on the solid body surface, or to create masks, according to the technique in focus. For the purposes of this application, the term solid body is intended to include any substrate on whose surface the microstructured diffraction grids can be produced by means of a laser, for example, glass, glass or sapphire watch glasses, ceramics, materials suitable synthetic materials, and mainly metallic surfaces in jewelry or coins, and particularly also surfaces coated with hard material from embossing tools, such as embossing dies and embossing plates for embossing metal packaging sheets, as well as organic solid bodies. The surface may have been pre-treated, chemically or mechanically processed and structured. As a coating of rigid material, for example, amorphous carbon bound in the form of tetrahedron (taC), tungsten carbide (WC), boron carbide (B4C), silicon carbide (SiC), or similar rigid materials can be contemplated.
[00010] Microstructures can, for example, be called glossy networks with network periods of 1 to 2 pm, and nanostructures can, for example, be self-organized waving structures with periods from 300 nm to 1000 nm that act as optical diffraction networks. As will be explained below, any periodic arrangement of optically active diffraction structures is possible, which produces an angular dependent dispersion, that is, a separation in spectral colors, through diffraction in irradiation with light.
[00011] In Figure 1, a first laser, an excimer 1 laser is shown.
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5/20 auger whose beam 2 has a rectangular cross section at present. The intensity of this laser beam can be adjusted and varied by an attenuator 3. Using homogenizer 3A and field lens 3B, a homogeneous intensity distribution across the cross section of the laser beam is created at the homogeneous point HS. The intensity profile through the cross section of the laser beam that is required for the microstructure to be produced is dimensioned from this homogeneous intensity distribution through the mask 18 positioned at the HS homogeneous point.
[00012] The geometric shape of the opening in diaphragm 6 disposed after the mask, and preferably in contact with it, produces the geometry or shape of the cross-section contour of the intensity profile of the laser beam dimensioned by mask 18. Mask 18 and diaphragm 6 is located on a mask and diaphragm changer device.
[00013] Instead of an excimer KrF laser, an excimer ArF laser that has a wavelength of 193 nm, a fluorine laser (F2) with a wavelength of 157 nm or an excimer XeCl laser with a wavelength 308 nm waveforms can be used as the first laser 1.
[00014] Instead of a femtosecond laser, a Nd: YAG type picosecond laser that has a wavelength of 1064 nm or its doubled frequency wavelength of 532 nm or its triple frequency wavelength of 266 nm can be used as a second laser 15.
[00015] The laser beam sized by mask 18 and diaphragm 6, see also Figure 2, invades a deflection mirror 7 that guides the beam through an image optics 8 appropriate for this laser beam that represents the profile of laser intensity suitable for the microstructure on surface 9 of the ta-C layer
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6/20 on a embossing roll 10 on a predetermined image scale of, for example, 8: 1. The rotation arrows 11 indicate that the embossing roller 10 can be rotated around its longitudinal geometric axis by means of predetermined angles. The embossing roller 10 is arranged on a displacement device 32.
[00016] In order to adjust, monitor and stabilize the force, and thus the intensity of the laser beam, a small fraction of the laser beam is directed through beam separator 4 on a force meter 5 that distributes data to the control of attenuator 3 and / or laser 1. This force gauge 5 can be selectively exchanged for a laser beam intensity measurement device 5A, which is indicated by a double arrow in Figure 1. Devices 5 and 5A are positioned at the same distance from the beam separator 4 as mask 18 is located at the homogeneous point HS in order to allow a correct measurement of the strength and intensity distribution of the laser beam at the homogeneous point HS, that is, in the plane of the mask. A camera 26 serves to observe the microstructuring process. For this purpose, the deflection mirror 7 has an interference layer system that reflects the excimer laser radiation of wavelength of 248 nm, but transmits visible light.
[00017] To adjust a precisely determined position of the image plane of the laser beam represented by image optics 8 in the ta-C layer to be structured over the entire surface area of the embossing roller 10, the position and the related deviations the production of the embossing roller from the ideal geometry are measured by means of the device 16 for the inspection of the position of the embossing roller, for example, by means of trigonometric measurement methods. These data are then used for the automatic adjustment of the embossing roller 10 by means of the displacement device 32 and for the correction of the z axis axis of the displacement device.
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7/20 during the structuring process.
[00018] As briefly already mentioned in the description of the exemplary modality according to Figure 1, the intensity profile required for the process of structuring the excimer laser according to the mask projection technique is dimensioned by means of a mask and a diaphragm.
[00019] This process will be explained in more detail below, at present, with reference to Figure 2: from the homogeneous intensity distribution 74 of the laser beam 29 at the HS homogeneous point, the intensity profile through the cross section of the laser beam The laser required for the microstructure to be produced in the ta-C layer on the embossing roller 10 is dimensioned by means of the mask 18 positioned at the homogeneous point HS. In the present schematic view, mask 18 has transparent areas 19 arranged in a network-like manner and surface areas 20 which are opaque to the laser beam, and then forms a network-like intensity profile 75 with parts of intensity profile cuboids.
[00020] Diaphragm 6, which in the direction of the laser beam is disposed after the mask and preferably in contact with it, produces the geometry of the cross section of the intensity profile of the laser beam dimensioned by mask 18 by the geometric shape of its opening or transparent surface area. In the present illustration, the shape of the aperture of the diaphragm 6T or the surface area of the diaphragm in the opaque part 6P that is transparent to the laser beam is in the shape of a triangle, and consequently, after the diaphragm, the intensity profile 76 of the 29A laser beam exhibits triangular cross-section geometry.
[00021] In Figure 2, the mesh period of the mask 18 and the thickness, as well as the spacing of the cuboidal intensity profile parts of the laser beam intensity profile 75, 76 after the bad
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8/20 faces are depicted on a strongly enlarged scale in the direction of the x coordinate. The mask net period measures in an example in a mask projection system image ratio from 8: 1, 4 to 20 pm in order to produce, for example, network structures with net periods of 0.5 at 5 pm on solid body surface 9, for example, a layer of ta-C on the embossing roll 10, by means of the laser beam 29A sized by the mask. In fact, with equal sizes of the surface areas of the homogeneous point HS and the structured mask area 18 of, for example, 8 mm x 8 mm = 64 mm 2 , the structured mask area, as opposed to the schematic illustration of Figure 2 , consists of a stripe network that has 2000 to 400 network periods, and the laser beam dimensioned between them consists of 2000 to 400 parts of cuboidal intensity profile.
[00022] The size, shape, spacing, position and number of transparent surface areas of mask 18, hereinafter called the mask structure, determine the laser beam intensity profile to create the microstructure that it has a predetermined optical effect in the ta-C layer, and diaphragm 6 determines the geometry of the cross section of the laser beam intensity profile and thus the geometric shape of the microstructured area element in the embossing roller. The term area element is used here to designate the surface on the embossing roll or embossing matrix which is structured by the laser beam sized by the mask and the diaphragm and represented on the ta-C coated roll surface in a pulse sequence. laser beam without a relative movement of the laser beam and the roller surface.
[00023] Consequently, due to a variation in the mask structure, and particularly when rotating the mask around the optical geometric axis of the laser beam by predetermined angles, the orientation of the laser beam intensity profile dimensioned by the mask and
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9/20 represented in the ta-C layer of the embossing roller by means of the focus optics 8 can be varied and then the optical effect of the microstructured area element in irradiation with polychromatic light, for example, the viewing direction and the viewing angle, as well as the color and intensity.
[00024] When rotating diaphragm 6 around the optical geometric axis of the laser beam by predetermined angles, the orientation of the cross section geometry dimensioned by the laser beam diaphragm represented in the ta-C layer on the embossing roller by means of the Focus optics are varied and so the orientation of the laser structured area element on the surface of the embossing roller.
[00025] The elements of the microstructured area can either be juxtaposed according to a particular pattern or, after rotating the mask by a predetermined angle, superimposed with the same microstructure under this predetermined angle. In addition, if different masks are used, different microstructures can be superimposed on an area element. If they are juxtaposed, the area elements can have the same or different surface shapes and microstructures.
[00026] When white light radiation, near sunlight, is diffracted or when a diffraction net is irradiated with polychromatic light, for example, with daylight fluorescent lamps or light bulbs, from now on, briefly called light, due to the diffraction angle dependent on the wavelength, the so-called diffraction angular dispersion occurs, that is, a separate one in spectral colors whose photons have a particular wavelength, that is, in monochromatic light. Therefore, if none of the diffraction rules overlap, only these spectral colors are observed in the diffracted light.
[00027] According to the invention, by means of network arrangements
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10/20 diffraction, mixed colors are created by superimposing multiple photon wavelengths of the spectral colors that can be viewed under one or multiple predetermined viewing angles and one or multiple predetermined azimuthal viewing directions of the grid arrangements. diffraction. Through the diffraction grid arrangements on a solid body surface that has different grid periods in the microscopic sub-areas = pixel areas of color below the resolution ability of the human eye, mixed colors are preferably produced, in the irradiation of the arrangement diffraction network with light, from the photons of the three different wavelengths of red, green and blue primary spectral color that appear in the diffraction spectrum, with the wavelengths for the primary spectral colors being selected depending on the intended application . Thus, if the mixed color has to be seen by the human eye, for the primary spectral color red, a wavelength of the X-red of 630 nm, for the green, a wavelength of the X-green of 530 nm, and for the blue, a Xazul wavelengths of 430 nm are, for example, advantageous.
[00028] The diffraction array arrangement can, for example, be composed of color pixel diffraction array areas that produce the primary colors red, green and blue, analogously to the cone photoreceptors of the human eye that contain three different types of visual pigments that are mainly sensitive to red, green, and blue. The types of applicable diffraction grating are, for example, groove and rib grids, column grating grids, and gloss grids that are, for example, produced by excimer laser structuring according to the mask projection technique. , or self-organized waving nets endowed with predetermined and adjusted waving net periods that are produced by femto or picosecond laser irradiation according to the technique in focus, or through
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11/20 of the overlap of both structures.
[00029] For a predetermined angle of incidence of light or a diffuse irradiation, respectively, the lattice period and the orientation of the diffraction grid in the color pixel area determine the diffraction directions of the spectral colors and, then, the angle of azimuth preview and viewing direction of the primary color of the individual color pixel. In this sense, the wavelengths of the mixed color have to be chosen and the diffraction networks of the arrays aligned, such that the diffraction angle and the diffraction direction of at least one diffraction order are the same for each wavelength of the mixed color in order to achieve an effective color mixture under at least one viewing angle in at least one azimuth viewing direction.
[00030] Hereinafter, the creation of a shiny network structure, as well as the production of a suitable mask to create the shiny network structure will be described with reference to Figures 3 to 8. In a shiny network, the maximum of the separation function and then the maximum of the highest intensity can be deviated from the maximum of the diffraction order of number 0 to a maximum of a larger diffraction order by varying the inclination of the steps, that is, through a variation of the brightness angle as, since the maximum of the separation function and then the maximum of the highest intensity is always located in the direction of reflection relative to the normal of the SN step. When you vary them, the diffraction angles m = viewing angles of the different diffraction orders and then the positions of the maximum diffraction in the network remain unchanged, as long as the network period and the incident angle a and the incident light are kept constant. . In addition, in Figure 3, s denotes the side of the network with brightness, there is the height of the network with brightness, eS is the incident beam, GN is the normal of the network, and SN is the normal of the step.
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12/20 [00031] Since practically the entire surface of the net, or more precisely, the surface formed by the width of the steps s multiplied by the length of the net gap and the number of cracks, is used for diffraction, the intensities of diffraction and, therefore, the observed brightness of the diffracted spectral colors are substantially greater in a shiny network than in diffraction in a simple stripe network = groove and rib network.
[00032] The shiny network structure of Figure 3 is produced using the mask of Figure 4, and this mask consists of a quartz glass substrate, the opaque surface of which can be produced by a femtosecond laser or laser beam. F2 while the transmitting triangular areas that are to produce the network structure with brightness in the irradiation with the previous excimer laser and the simultaneous scanning of the mask are spared. through irradiation with femtosecond laser pulses or fluorine laser pulses, the surface of the quartz substrate is roughened and modified so that the incident light is scattered but not absorbed. The modified term designates a change in the density of the material, structure and refractive index of the substrate at present. In this way, a very low thermal load, a high dimensional accuracy and a very long lifetime of such masks are guaranteed.
[00033] In the production of the mask on the quartz glass substrate using the femtosecond laser according to the technique in focus or the F2 laser according to the mask projection technique, the non-transparent area that makes the triangular areas transparent Free transmitters are produced by scanning with the smallest possible cross-section of focus or F image and overlapping laser pulses that are represented in Figure 4 as small gray filled circles of the fs laser or small black filled circles of the F2 laser. The small squares indicate that the shapes
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13/20 drafts of the cross section of the laser beam can be used as well. Thus, except for the transmitting triangular areas shown in white, the entire surface area shown in gray in Figure 4 is scanned. More specifically, the surface of the scanned areas is roughened and modified with an appropriate laser beam fluency, such that these areas strongly spread the incident laser beam parts of the excimer laser and then act as opaque areas. for the laser beam. [00034] The quantity G is the base of the transmitting triangle and is equal to 8 x the constant of the g network, since an image ratio of 8: 1 is used at present to produce the network with brightness according to the technique of projection of an excimer laser mask through this mask. correspondingly, H is the height and φ the base angle of the transmitting triangle, and I is the distance between the transmitting triangles in the scanning direction of the mask. if an F2 laser installation is used, an image ratio other than 25: 1 is used.
[00035] Glossy mesh structures can alternatively be produced using stripe masks 79 according to Figure 5, with the stripe mask having two different stripe widths, as required to produce a mesh slit with brightness, whose transmittance varies between 0 and 1 and between 1 and 0 over the respective stripe width according to the predetermined linear or step functions. Again at present, the indications 8g and 8g x sine «b result from the 8: 1 image ratio used in the creation of the bright network structures according to the mask projection technique.
[00036] There are a large number of possible variations in the production of suitable masks that can be created by means of laser installations fs or F2. The selected masks are placed together with the appropriate diaphragms in a changer device to produce the shiny mesh structures in the first laser installation
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14/20
L1, that is, for an excimer 1 laser according to the mask projection technique. diaphragms can be produced according to the same production technique as masks. As substrates for masks or diaphragms, quartz glass (SiO2), sapphire (AbO3), calcium fluoride (CaF2), or magnesium fluoride (MgF2) can be used.
[00037] The femtosecond laser can be used to produce ripples that are arranged in a network structure and allows to create spectral colors that can be mixed. For the adjustable creation of different ripple spacing that produce the desired network constant for the creation of the respective spectral color, the substrate plane is inclined by an angle determined with respect to the laser beam during the creation of the ripples.
[00038] Since, as already mentioned, the eye is only capable of resolving an area of 200 gm x 200 gm, the maximum lateral length of a square color pixel has to be less than 200 gm divided by three = 66.67 gm. So, to produce a mixed color, a 200 gm x 200 gm subarea contains at least 9 pixels of color per square for the primary colors red, green, and blue, with each color pixel, by definition, containing a single color spectral as the primary color. Thus, for a color pixel side length of 33.33 gm, a subarea 81 according to Figure 8 contains a total of 36 color pixels per square 82, 83, 84 for the primary colors red, green, and blue .
[00039] These orders of magnitude enable a new class of authentication characteristics where, in a particular subarea, for example, one or just a few pixels of color of a different color are interspersed than those visible to the eye, but detectable by an adapted spectrometer .
[00040] In the present below, an exemplary calculation for a
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15/20 network structure according to subarea 81 of Figure 8 is indicated. For a lateral length of one color pixel per square of 33.33 qm, the incidence of perpendicular light and a diffraction angle = viewing angle am for red, green, and blue of 30 ° with the values calculated for the periods of red grid = 1.26 qm, green = 1.06 qm, g to zul = 0.86 qm, the red pixel square restricts 29 grid periods, the green pixel square, 38 grid periods, and the square blue pixel, 47 network periods.
[00041] The diffraction intensity of a color pixel is a function of the number of network periods, that is, the total length of the network gap in the color pixel, and the wavelength of the primary color. Intensity control can only be achieved through the size of the surface area or the number of individual primary color pixels, respectively. In this sense, different factors, such as the light source, have to be taken into account, that is, for example, sunlight during the day, in the morning or at night, fluorescent lamp for daylight, light bulb. light or the like, which have different intensity characteristics in the variation of the emitted wavelength and then influence the intensity of each spectral color. Furthermore, the human eye, that is, the photopic spectral sensitivity of the human eye for the selected wavelengths of the primary colors has to be taken into account.
[00042] According to the calculations based on the color flow of the DIN 5033 standard, the white color is, for example, obtained from the aforementioned spectral colors red, green, and blue produced by the diffraction of the grid in a direction of visualization with the following pixel outline when a sub-area of 200 qm x 200 qm made of 36 pixels of color that has a pixel surface area of 33.33 qm x 33.33 qm, each one is composed of: 14 pixels of red color 82, 10 green color pixels 83, and 12 blue color pixels 84.
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16/20
According to the same calculations, the pink color is obtained with the following pixel sketch: 22 red pixels 82, 3 green pixels 83, and 11 blue pixels 84. Based on the same calculation, the skin color is obtained with the following pixel outline: 21 red pixels 82, 7 green pixels 83, and 8 blue pixels 84.
[00043] The reference to the resolution ability of the human eye does not mean that the spectral and mixed colors produced are not machine readable and analyzable as well. Especially in the case of authentication characteristics, which would generally be as small as possible, machine reading is particularly appropriate.
[00044] For a predetermined angle of incidence of light, the lattice period and the orientation of the diffraction grid in the color pixel area determine the diffraction directions of the spectral colors and thus the viewing angle and viewing direction azimuth of the primary color of the individual pixel. In this sense, the different network periods for the individual wavelengths of the mixed color have to be chosen and the diffraction networks of the arrays aligned, such that the diffraction angle and the diffraction direction of at least one diffraction order are the same for each wavelength of the mixed color in order to achieve an effective color blend under at least one viewing angle in at least one azimuth viewing direction.
[00045] According to Figure 3, in the network with brightness 77, «b is the angle of inclination of the diffraction grid slits (angle of brightness) and the diffraction angle a m is the angle between the normal of the GN network and the direction of diffraction of the maximum intensity of the part of the diffracted monochromatic beam gs of the respective diffraction order z and therefore indicates the viewing angle a m and the viewing direction gS for this part of the beam at a predetermined angle of incidence αθ.
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17/20 [00046] The diffraction angle am is determined by the wavelength of the incident light, the angle of incidence ae, and the network period g. The term azimuthal viewing direction aB of the part of the diffracted monochromatic beam refers to the direction, which originates from the normal of the GN network, the intersection line of the plane traversed by the normal of the network and the diffraction direction gS with the GE network plane , which is characterized by the azimuth angle az, see also Figure 7. In Figure 7, sB denotes the viewing direction of the diffracted beam.
[00047] Thus, the viewing angle for the mixed color is, moreover, dependent on the compatible network periods of the different types of color pixels, and the viewing direction is determined by the orientation of the network structures, that is, of cracks GF network in the different color pixel areas required to create the mixed color. The creation of a mixed color has to be achieved in a subarea that is no longer capable of being resolved to the human eye at a maximum of 200 pm x 200 pm which is formed by a sufficient amount of different color pixel areas.
[00048] Multiple viewing directions can be perceived if the GF mesh slits in the color pixels have multiple azimuth orientations: if, for example, the mesh structures in one half of the pixels of a primary color contained in a subarea are arranged perpendicularly to the network structures in the other half of the pixels, there are also two azimuthal viewing directions aB perpendicular to each other, especially in the irradiation of the network with diffuse white light, see Figure 8. For this purpose, however, half of the total amount of pixels of color in the subarea must be sufficient to produce the mixed color. In this case, however, the mixed color will be perceived with reduced intensity in each of the two azimuth visualization directions.
[00049] Also, in this way, three azi viewing directions
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18/20 mutals that are displaced 120 ° from one another can be realized. According to Figure 6, with the help of a column grid grid 80, that is, by columns P in the form of elevations or complementary wells of different shapes of cross section, for example, circular, triangular, rectangular, hexagonal and different dimensions, multiple azimuthal viewing directions can be realized. For example, a cross section of the well or triangular column results in three azimuthal viewing directions aB which are offset by 2/3 π = 120 °.
[00050] In different pixel sizes for the primary colors are chosen, the lateral lengths of the widest pixels must be an integer multiple of the lateral length of the smallest pixel so that the subarea can be completely filled with color pixels in order to achieve the color intensity mixed as much as possible. A reduction in intensity, that is, a dimming effect, can be achieved by inserting pixel areas in the subarea that are, for example, unstructured in the case of ta-C layer substrates or have mesh structures that absorb lengths of light wave or diffraction in a different direction.
[00051] To control the intensity of the primary colors for the creation of mixed colors, in addition to the quantity and surface area of the color pixels and the choice of the diffraction order of the pixels in the viewing direction, different types of diffraction grids in the pixels of the primary colors of a subarea can be used since, for example, networks with brightness produce higher intensities than groove and rib networks.
[00052] According to the invention, diffraction grid arrangements are applied to the surfaces of solid bodies, such as metals, metal alloys, glass, synthetic materials that have rigid surfaces, as well as layers of ta-C or other materials rigid, such as
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19/20 hard metals, carbides, such as tungsten carbide or boron carbide. More specifically, diffraction grid arrangements can be applied to rigid wear-resistant materials, for example, embossing tools to emboss authentication features, color patterns or signs that have a color effect on packaging foils, although it is evident that the negative of the diffraction grid structures in the embossing tool has to be designed with such a geometry of the cross section and such dimensions of the microstructures that based on the properties of the material to be embossed and the embossing parameters, the positive Embossed represents the optimal diffraction grid pattern for the optical diffraction effect.
[00053] The first L1 laser installation with a diaphragm and mask changer that allows any desired mask and any desired diaphragm to be placed in the excimer laser beam path enables a wide variety not only of different network structures that have different network constraints, but also a large number of possible designs of the outer contour of the areas of the network structure. Thus, it is possible to design the shape of the area elements that are composed of a plurality of subareas such as squares, rectangles, triangles, parallelograms, hexagons, etc., or possibly as circles, the most diverse network structures to create mixed colors and colors that are possible in these area elements. In certain arrangements, it is also possible, for example, to create cube patterns that appear three-dimensionally composed of three parallelograms or stars that have multiple radii.
[00054] Furthermore, the two laser installations allow the most diverse network structures to be superimposed, for example, first to produce a particular network structure and area elements
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20/20 arranged in a pattern by means of the excimer laser, in which the waveguide structures are applied by means of the femtosecond laser in order to create another combination of colors and mixed colors that can particularly also be used as characteristics of authentication. Also, different viewing angles can be made or gradual or continuous color changes, or the appearance and disappearance of color patterns or color images in the tilt or rotation of the diffraction grid pattern by a gradual variation of the grid periods or the orientation of the network cracks.
权利要求:
Claims (14)
[1]
1. Method to create color patterns by means of diffraction grids in the light irradiation, in which the diffraction grid arrangements are produced directly on a solid body surface in a laser microstructuring process, with each grid arrangement diffraction is composed of subareas (81) whose longitudinal dimension has a value below the eye's resolution ability and each subarea contains at least one pixel (82, 83, 84), with one pixel (82, 83, 84) being a limited diffraction network structure to produce a single spectral color, which is diffracted by the chosen network parameters and the angle of incidence (αθ) in the diffraction angles (am) determined in at least one azimuth viewing angle (aB) determined, the method being characterized by the fact that the diffraction grid arrangements are produced directly on the solid body surface in a laser microstructuring process through irradiation o with at least one laser installation in the nanosecond range or in the peak or femtosecond range, and where each subarea (81) contains at least two pixels (82, 83, 84), each of which has a network constant different to produce two different spectral colors at the same diffraction angle (am) at the same azimuth viewing angle (aB).
[2]
2. Method according to claim 1, characterized by the fact that the wavelengths for the primary spectral colors red, green and blue are selected according to the intended application, and that if the mixed color is visualized by the human eye, the three colors are red, green and blue with an X-red wavelength of 630 nm, X-green of 530 nm, and X-blue of 430 nm.
[3]
3. Method, according to claim 1 or 2, characterized by the fact that the pixels (82, 83, 84) are networks with linear brightness
Petition 870190095730, of 09/25/2019, p. 27/35
2/4 res or annular, linear or annular groove and rib networks or column networks with a circular or polygonal cross section.
[4]
4. Method according to claim 3, characterized by the fact that the nets are produced using the laser mask projection procedure by means of masks (18) that are arranged in a mask changing and rotational device and diagram along the way of the excimer laser beam.
[5]
5. Method according to claim 4, characterized by the fact that the masks (18) are produced by means of a femtosecond laser according to the technique in focus or by means of a fluorine laser according to the technique of mask projection, a surface of a substrate that is irradiated such that non-transparent areas are produced by roughening or modifying the surface, and the substrate is quartz glass (SiO2), sapphire (Al2O3), calcium fluoride ( CaF2) or magnesium fluoride (MgF2).
[6]
6. Method according to claim 1 or 2, characterized by the fact that the pixels (82, 83, 84) comprise diffraction grids in the form of ripples produced by a peak or femtosecond laser.
[7]
7. Method according to claim 3 or 6, characterized by the fact that the pixels (82, 83, 84) are obtained by superimposing the network and the undulation structures.
[8]
Method according to any one of claims 1 to 7, characterized in that the solid body surface is a surface coated with rigid material from a embossing roller or a embossing matrix for embossing the packaging metal sheets , the coating of rigid material consisting of ta-C, tungsten carbide (WC), boron carbide (B4C), silicon carbide (SiC) or similar rigid materials.
Petition 870190095730, of 09/25/2019, p. 28/35
3/4
[9]
9. Device for implementing the method, as defined in any one of claims 1 to 12, characterized by the fact that the first laser installation (L1) for the production of glossy networks, groove and rib networks, or column grids comprise an excimer KrF laser (1) with a wavelength of 248 nm, or an excimer ArF laser with a wavelength of 193 nm, or a fluorine laser with a wavelength of 157 nm , or an excimer XeCl laser with a wavelength of 308 nm, and the second laser installation (L2) for producing the undulation structures comprises a femtosecond laser (15) with a central wavelength of 775 nm or its doubled or tripled frequency wavelength or a Nd: YAG type picosecond laser with a wavelength of 1064 nm or its doubled or tripled frequency wavelength.
[10]
10. Device according to claim 9, characterized by the fact that between the first laser (1) and its image optics (8), at least one combination of mask and diaphragm (18, 6) is arranged, with numerous mask and diaphragm combinations are arranged in a rotating and changing device and the changing device is adapted to place both one of the masks (18) and one of the diaphragms (6) in the beam path (29) of the laser (1) independently each other, the masks (18) and the diaphragms (6) being arranged in retainers while being linearly or pivotally movable around themselves.
[11]
Device according to claim 10, characterized in that the mask (6) is a triangular mask (78) or a stripe mask (79) to produce shiny networks.
[12]
Device according to any one of claims 9 to 11, characterized in that it produces optically effective signals
Petition 870190095730, of 09/25/2019, p. 29/35
4/4 diffraction or authentication characteristics on coated or uncoated watch parts, glass or sapphire watch glasses, coins or decorative objects.
[13]
13. Embossed packaging foil with embossing rolls or matrices structured as defined in claim 12, characterized by the fact that it has optically effective diffraction areas and / or authentication features that comprise color pixels of a spectral color or pixels different colors to create mixed colors.
[14]
14. Packing foil according to claim 13, characterized by the fact that it is sanitized in those locations where no effective optically diffractive area, authentication features and / or logos are provided.
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同族专利:
公开号 | 公开日
EP2336810A1|2011-06-22|
US20120243094A1|2012-09-27|
WO2011072408A1|2011-06-23|
CN102792193B|2016-08-10|
JP5905394B2|2016-04-20|
CA2781475A1|2011-06-23|
BR112012014869A2|2016-03-29|
EP2513687A1|2012-10-24|
US9140834B2|2015-09-22|
CN102792193A|2012-11-21|
CA2781475C|2018-09-04|
RU2012124337A|2014-09-27|
RU2593618C2|2016-08-10|
JP2013514539A|2013-04-25|
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法律状态:
2019-01-08| B06F| Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]|
2019-08-06| B06U| Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette]|
2019-12-10| B09A| Decision: intention to grant [chapter 9.1 patent gazette]|
2020-01-21| B16A| Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]|Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 22/11/2010, OBSERVADAS AS CONDICOES LEGAIS. |
优先权:
申请号 | 申请日 | 专利标题
EP20090405227|EP2336810A1|2009-12-18|2009-12-18|Method and device for generating colour patterns using a diffraction grating|
PCT/CH2010/000294|WO2011072408A1|2009-12-18|2010-11-22|Method and device for generating colour patterns using a diffraction grating|
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